SCOPUS 정보 검색 플랫폼

Volumn 520, Issue 6, 2012, Pages 1740-1744

Applicability of X-ray fluorescence spectroscopy as method to determine thickness and composition of stacks of metal thin films: A comparison with imaging and profilometry

(4) Vrielink, J A M a Tiggelaar, R M a Gardeniers, J G E a Lefferts, L a

a UNIVERSITY OF TWENTE (Netherlands)

Author keywords

Density; Metal thin films; Non destructive; Profilometry; Scanning electron microscopy; Thickness; X ray fluorescence

Indexed keywords

METAL THIN FILMS; NON DESTRUCTIVE; SCANNING ELECTRONS; THICKNESS; X RAY FLUORESCENCE;

DENSITY (SPECIFIC GRAVITY); FLUORESCENCE; FLUORESCENCE SPECTROSCOPY; PROFILOMETRY; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTING SILICON COMPOUNDS; THIN FILMS; X RAYS;

METALS;

EID: 84855967267 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.08.049 Document Type: Article

Times cited : (34)

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