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Volumn 57, Issue 1, 2006, Pages 12-16

Determination of thickness, density and roughness of Co-Ni-Al single and multiple layer films deposited by high-vacuum e-beam evaporation on different substrates

Author keywords

Multiple layers; Roughness; Thickness; X ray reflectometry

Indexed keywords

ALUMINUM COMPOUNDS; COBALT COMPOUNDS; DEPOSITION; NICKEL COMPOUNDS; SURFACE ROUGHNESS; THICKNESS MEASUREMENT;

EID: 33744976993     PISSN: 10445803     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchar.2005.12.001     Document Type: Article
Times cited : (7)

References (8)
  • 3
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    • Quantitative thickness determination using X-ray fluorescence: application to multiple layers
    • Nygard K., Hämäläinen K., Manninen S., Jalas P., and Ruottinen J.-P. Quantitative thickness determination using X-ray fluorescence: application to multiple layers. X-ray Spectrom 33 (2004) 354-359
    • (2004) X-ray Spectrom , vol.33 , pp. 354-359
    • Nygard, K.1    Hämäläinen, K.2    Manninen, S.3    Jalas, P.4    Ruottinen, J.-P.5
  • 4
    • 1142291777 scopus 로고    scopus 로고
    • X-ray reflectivity and spectroscopic ellipsometry as metrology tools for the characterization of interfacial layers in high-κ materials
    • Ferrari S., Modreanu M., Scarel G., and Fanciulli M. X-ray reflectivity and spectroscopic ellipsometry as metrology tools for the characterization of interfacial layers in high-κ materials. Thin Solid Films 450 (2004) 124-127
    • (2004) Thin Solid Films , vol.450 , pp. 124-127
    • Ferrari, S.1    Modreanu, M.2    Scarel, G.3    Fanciulli, M.4
  • 5
    • 10744229968 scopus 로고    scopus 로고
    • In-line monitoring of advanced microelectronics processes using combined X-ray techniques
    • Wyon C., Delille D., Gonchond J.P., Heider F., Kwakman L., Marthon S., et al. In-line monitoring of advanced microelectronics processes using combined X-ray techniques. Thin Solid Films 450 (2004) 84-89
    • (2004) Thin Solid Films , vol.450 , pp. 84-89
    • Wyon, C.1    Delille, D.2    Gonchond, J.P.3    Heider, F.4    Kwakman, L.5    Marthon, S.6
  • 6
    • 0030681208 scopus 로고    scopus 로고
    • Thin film and surface characterization by specular X-ray reflectivity
    • Chason E., and Mayer T.M. Thin film and surface characterization by specular X-ray reflectivity. Crit Rev Solid State Mater Sci 22 (1997) 1-67
    • (1997) Crit Rev Solid State Mater Sci , vol.22 , pp. 1-67
    • Chason, E.1    Mayer, T.M.2
  • 7
    • 26144449160 scopus 로고
    • Surface studies of solids by total reflection of X-rays
    • Parratt L.G. Surface studies of solids by total reflection of X-rays. Phys Rev 95 (1954) 359-369
    • (1954) Phys Rev , vol.95 , pp. 359-369
    • Parratt, L.G.1
  • 8
    • 0000515073 scopus 로고
    • Caracterisation des surface par reflexion rasante de rayons X. Application a l'etude du polissage de quelques verres silicates
    • Névot L., and Croce P. Caracterisation des surface par reflexion rasante de rayons X. Application a l'etude du polissage de quelques verres silicates. Rev Phys Appl 15 (1980) 761-779
    • (1980) Rev Phys Appl , vol.15 , pp. 761-779
    • Névot, L.1    Croce, P.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.