Broadband antireflective Si nanopillar arrays produced by nanosphere lithography

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 850-852

  Xu, Hongbo ^a   Lu, Nan ^a   Qi, Dianpeng ^a   Gao, Liguo ^a   Hao, Juanyuan ^a   Wang, Yandong ^a   Chi, Lifeng ^a,b  

^a Jilin University   (China)

^b UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Broadband antireflective; Monolayer of spheres; Reactive ion etching; Si nanopillar arrays

Indexed keywords

BROADBAND ANTIREFLECTIVE; NANOSPHERE LITHOGRAPHIES; SI NANOPILLAR ARRAYS; SPECTRAL POSITIONS; WAVELENGTH RANGES;

NANOSPHERES; SILICON; SPHERES;

REACTIVE ION ETCHING;

EID: 67349264080     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.01.059     Document Type: Article

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