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Volumn 91, Issue 32, 2011, Pages 4073-4088
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Influence of surface orientation and defects on early-stage oxidation and ultrathin oxide growth on pure copper
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Author keywords
Copper; Molecular dynamics; Oxidation; ReaxFF
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Indexed keywords
COPPER SURFACE;
CU ATOMS;
HIGHER TEMPERATURES;
HOLLOW SITES;
KEY ELEMENTS;
METAL SUBSTRATE;
MOLECULAR DYNAMICS SIMULATIONS;
MULTIPLE-GROUP;
NANO SCALE;
OXIDATION AND OXIDES;
OXIDATION KINETICS;
OXIDATION RATES;
OXIDE LAYER;
OXIDE LAYER GROWTH;
OXYGEN ADSORPTION;
PURE COPPER;
REAXFF;
STRUCTURE FACTORS;
SURFACE DISORDER;
SURFACE ORIENTATION;
SURFACE OXIDE;
TEMPERATURE CONDITIONS;
THEORETICAL STUDY;
ULTRA-THIN OXIDE;
COPPER;
CRYSTAL ORIENTATION;
GAS ADSORPTION;
GROWTH KINETICS;
KINETICS;
METALLIC GLASS;
MOLECULAR DYNAMICS;
MOLECULAR ORIENTATION;
OXIDATION;
OXYGEN;
SINGLE CRYSTAL SURFACES;
SURFACE DEFECTS;
SURFACE RECONSTRUCTION;
TEMPERATURE;
SURFACE MORPHOLOGY;
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EID: 84855439156
PISSN: 14786435
EISSN: 14786443
Source Type: Journal
DOI: 10.1080/14786435.2011.598881 Document Type: Article |
Times cited : (37)
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References (53)
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