메뉴 건너뛰기




Volumn 59, Issue 1, 2012, Pages 206-211

Comparisons of performance potentials of Si and InAs nanowire MOSFETs under ballistic transport

Author keywords

Ballistic transport; first principles calculation; high mobility semiconductors; nanowire transistors; power delay product (PDP); quantum capacitance

Indexed keywords

BALLISTIC TRANSPORTS; FIRST-PRINCIPLES CALCULATION; HIGH-MOBILITY SEMICONDUCTORS; NANOWIRE TRANSISTORS; POWER-DELAY PRODUCTS; QUANTUM CAPACITANCE;

EID: 84855421083     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/TED.2011.2172615     Document Type: Article
Times cited : (20)

References (20)
  • 4
    • 79955539931 scopus 로고    scopus 로고
    • Full three-dimensional quantum transport simulation of atomistic interface roughness in silicon nanowire FETs
    • May
    • S. Kim, M. Luisier, A. Paul, T. B. Boykin, and G. Klimeck, "Full three-dimensional quantum transport simulation of atomistic interface roughness in silicon nanowire FETs," IEEE Trans. Electron Devices, vol. 58, no. 5, pp. 1371-1380, May 2011.
    • (2011) IEEE Trans. Electron Devices , vol.58 , Issue.5 , pp. 1371-1380
    • Kim, S.1    Luisier, M.2    Paul, A.3    Boykin, T.B.4    Klimeck, G.5
  • 7
    • 2442537377 scopus 로고    scopus 로고
    • Efficient iterative schemes for ab initio total-energy calculation using a plane-wave basis set
    • Oct.
    • G. Kresse and J. Furthmüller, "Efficient iterative schemes for ab initio total-energy calculation using a plane-wave basis set," Phys. Rev. B, vol. 54, no. 16, pp. 11 169-11 186, Oct. 1996.
    • (1996) Phys. Rev. B , vol.54 , Issue.16 , pp. 11169-11186
    • Kresse, G.1    Furthmüller, J.2
  • 8
    • 44949249071 scopus 로고    scopus 로고
    • Bandstructure effects in silicon nanowire electron transport
    • DOI 10.1109/TED.2008.920233
    • N. Neophytou, A. Paul, M. Lundstrom, and G. Klimeck, "Bandstruc-ture effects in silicon nanowire electron transport," IEEE Trans. Electron Devices, vol. 55, no. 6, pp. 1286-1297, Jun. 2008. (Pubitemid 351803228)
    • (2008) IEEE Transactions on Electron Devices , vol.55 , Issue.6 , pp. 1286-1297
    • Neophytou, N.1    Paul, A.2    Lundstrom, M.S.3    Klimeck, G.4
  • 9
    • 76249092549 scopus 로고    scopus 로고
    • Comparisons of performance potentials of silicon nanowire and graphene nanoribbon MOSFETs considering first-principles band-structure effects
    • Feb.
    • H. Tsuchiya, H. Ando, S. Sawamoto, T. Maegawa, T. Hara, H. Yao, and M. Ogawa, "Comparisons of performance potentials of silicon nanowire and graphene nanoribbon MOSFETs considering first-principles band-structure effects," IEEE Trans. Electron Devices, vol. 57, no. 2, pp. 406-414, Feb. 2010.
    • (2010) IEEE Trans. Electron Devices , vol.57 , Issue.2 , pp. 406-414
    • Tsuchiya, H.1    Ando, H.2    Sawamoto, S.3    Maegawa, T.4    Hara, T.5    Yao, H.6    Ogawa, M.7
  • 10
    • 78049253018 scopus 로고    scopus 로고
    • Electronic properties and orientation-dependent performance of InAs nanowire transistors
    • Nov.
    • K. Alam and R. N. Sajjad, "Electronic properties and orientation-dependent performance of InAs nanowire transistors," IEEE Trans. Electron Devices, vol. 57, no. 11, pp. 2880-2885, Nov. 2010.
    • (2010) IEEE Trans. Electron Devices , vol.57 , Issue.11 , pp. 2880-2885
    • Alam, K.1    Sajjad, R.N.2
  • 11
    • 33947147843 scopus 로고    scopus 로고
    • Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations
    • Mar.
    • M. Luisier, A. Schenk, and W. Fichtner, "Atomistic treatment of interface roughness in Si nanowire transistors with different channel orientations," Appl. Phys. Lett., vol. 90, no. 10, pp. 102103-1-102103-3, Mar. 2007.
    • (2007) Appl. Phys. Lett. , vol.90 , Issue.10 , pp. 1021031-1021033
    • Luisier, M.1    Schenk, A.2    Fichtner, W.3
  • 12
    • 59949097581 scopus 로고    scopus 로고
    • Band structure effects on the scaling properties of InAs nanowire MOSFETs
    • Feb.
    • E. Lind, M. P. Persson, Y.-M. Niquet, and L.-E. Wernersson, "Band structure effects on the scaling properties of InAs nanowire MOSFETs," IEEE Trans. Electron Devices, vol. 56, no. 2, pp. 201-205, Feb. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.2 , pp. 201-205
    • Lind, E.1    Persson, M.P.2    Niquet, Y.-M.3    Wernersson, L.-E.4
  • 13
    • 56549110429 scopus 로고    scopus 로고
    • Performance of n-type InSb and InAs nanowire field-effect transistors
    • Nov.
    • M. A. Khayer and R. K. Lake, "Performance of n-type InSb and InAs nanowire field-effect transistors," IEEE Trans. Electron Devices, vol. 55, no. 11, pp. 2939-2945, Nov. 2008.
    • (2008) IEEE Trans. Electron Devices , vol.55 , Issue.11 , pp. 2939-2945
    • Khayer, M.A.1    Lake, R.K.2
  • 14
    • 65449154302 scopus 로고    scopus 로고
    • Strain effects on electronic bandstructures in nanoscaled silicon: From bulk to nanowire
    • Apr.
    • T. Maegawa, T. Yamauchi, T. Hara, H. Tsuchiya, and M. Ogawa, "Strain effects on electronic bandstructures in nanoscaled silicon: From bulk to nanowire," IEEE Trans. Electron Devices, vol. 56, no. 4, pp. 553-559, Apr. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.4 , pp. 553-559
    • Maegawa, T.1    Yamauchi, T.2    Hara, T.3    Tsuchiya, H.4    Ogawa, M.5
  • 15
    • 77950098054 scopus 로고    scopus 로고
    • Role of carrier transport in source and drain electrodes of high-mobility MOSFETs
    • Apr.
    • H. Tsuchiya, A. Maenaka, T. Mori, and Y. Azuma, "Role of carrier transport in source and drain electrodes of high-mobility MOSFETs," IEEE Electron Device Lett., vol. 31, no. 4, pp. 365-367, Apr. 2010.
    • (2010) IEEE Electron Device Lett. , vol.31 , Issue.4 , pp. 365-367
    • Tsuchiya, H.1    Maenaka, A.2    Mori, T.3    Azuma, Y.4
  • 16
    • 80051585452 scopus 로고    scopus 로고
    • Influence of source/drain parasitic resistance on device performance of ultrathin body III-V channel metal-oxide-semiconductor field-effect transistors
    • Aug.
    • Y. Maegawa, S. Koba, H. Tsuchiya, and M. Ogawa, "Influence of source/drain parasitic resistance on device performance of ultrathin body III-V channel metal-oxide-semiconductor field-effect transistors," Appl. Phys. Exp., vol. 4, no. 8, pp. 084301-1-084301-3, Aug. 2011.
    • (2011) Appl. Phys. Exp. , vol.4 , Issue.8 , pp. 0843011-0843013
    • Maegawa, Y.1    Koba, S.2    Tsuchiya, H.3    Ogawa, M.4
  • 17
    • 41749110900 scopus 로고    scopus 로고
    • Outperforming the conventional scaling rules in the quantum-capacitance limit
    • DOI 10.1109/LED.2008.917816
    • J. Knoch, W. Riess, and J. Appenzeller, "Outperforming the conventional scaling rules in the quantum-capacitance limit," IEEE Electron Device Lett., vol. 29, no. 4, pp. 372-374, Apr. 2008. (Pubitemid 351486785)
    • (2008) IEEE Electron Device Letters , vol.29 , Issue.4 , pp. 372-374
    • Knoch, J.1    Riess, W.2    Appenzeller, J.3
  • 18
    • 33846078206 scopus 로고    scopus 로고
    • Novel channel materials for ballistic nanoscale MOSFETs-bandstructure effects
    • 1609421, IEEE International Electron Devices Meeting, 2005 IEDM - Technical Digest
    • A. Rahman, G. Klimeck, and M. Lundstrom, "Novel channel materials for ballistic nanoscale MOSFETs - Bandstructure effects," in IEDM Tech. Dig., Dec. 2005, pp. 601-604. (Pubitemid 46370923)
    • (2005) Technical Digest - International Electron Devices Meeting, IEDM , vol.2005 , pp. 601-604
    • Rahman, A.1    Klimeck, G.2    Lundstrom, M.3
  • 19
    • 70350077507 scopus 로고    scopus 로고
    • The quantum and classical capacitance limits of InSb and InAs nanowire FETs
    • Oct.
    • M. A. Khayer and R. K. Lake, "The quantum and classical capacitance limits of InSb and InAs nanowire FETs," IEEE Trans. Electron Devices, vol. 56, no. 10, pp. 2215-2223, Oct. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.10 , pp. 2215-2223
    • Khayer, M.A.1    Lake, R.K.2
  • 20
    • 62749117201 scopus 로고    scopus 로고
    • Performance comparison between p-i-n tunneling transistors and conventional MOSFETs
    • Mar.
    • S. O. Koswatta, M. S. Lundstrom, and D. E. Nikonov, "Performance comparison between p-i-n tunneling transistors and conventional MOSFETs," IEEE Trans. Electron Devices, vol. 56, no. 3, pp. 456-465, Mar. 2009.
    • (2009) IEEE Trans. Electron Devices , vol.56 , Issue.3 , pp. 456-465
    • Koswatta, S.O.1    Lundstrom, M.S.2    Nikonov, D.E.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.