SCOPUS 정보 검색 플랫폼

Journal of Alloys and Compounds

Volumn 515, Issue , 2012, Pages 4-7

4-nm thick multilayer structure of multi-component (AlCrRuTaTiZr)N x as robust diffusion barrier for Cu interconnects

(4) Chang, Shou Yi a Li, Chen En a Chiang, Sheng Cheng a Huang, Yi Chung a

a NATIONAL CHUNG HSING UNIVERSITY (Taiwan)

Author keywords

Diffusion barrier; Multi component; Multilayer

Indexed keywords

ALUMINUM ALLOYS; CHROMIUM ALLOYS; COPPER; INTEGRATED CIRCUIT INTERCONNECTS; MULTILAYERS; RUTHENIUM ALLOYS; SILICIDES; TANTALUM ALLOYS; TITANIUM ALLOYS; ZIRCONIUM ALLOYS;

AMORPHOUS SOLID SOLUTIONS; DIFFUSION BARRIER LAYERS; LATTICE DISTORTIONS; MULTICOMPONENTS; MULTILAYER STACKING; MULTILAYER STRUCTURES; MULTIPLE COMPONENTS; THICK MULTILAYERS;

DIFFUSION BARRIERS;

EID: 84855419780 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.11.082 Document Type: Letter

Times cited : (87)

References (22)

1
- 0022738306
- J.D. McBrayer, R.M. Swanson, and T.W. Sigmon J. Electrochem. Soc. 133 1986 1242 1246
- (1986) J. Electrochem. Soc. , vol.133 , pp. 1242-1246
- McBrayer, J.D.¹ Swanson, R.M.² Sigmon, T.W.³

2
- 1342309027
- C.A. Chang J. Appl. Phys. 67 1990 566 569
- (1990) J. Appl. Phys. , vol.67 , pp. 566-569
- Chang, C.A.¹

3
- 0033708430
- A.E. Kaloyeros, and E. Eisenbraun Annu. Rev. Mater. Sci. 30 2000 363 385
- (2000) Annu. Rev. Mater. Sci. , vol.30 , pp. 363-385
- Kaloyeros, A.E.¹ Eisenbraun, E.²

4
- 0032097699
- T. Kouno, H. Niwa, and M. Yamada J. Electrochem. Soc. 145 1998 2164 2167
- (1998) J. Electrochem. Soc. , vol.145 , pp. 2164-2167
- Kouno, T.¹ Niwa, H.² Yamada, M.³

5
- 84855446656
- M.H. Tsai, S.C. Sun, C.E. Tsai, S.H. Chuang, and H.T. Chiu J. Appl. Phys. 79 1996 6032 6938
- (1996) J. Appl. Phys. , vol.79 , pp. 6032-6938
- Tsai, M.H.¹ Sun, S.C.² Tsai, C.E.³ Chuang, S.H.⁴ Chiu, H.T.⁵

6
- 4344696109
- Y. Liu, S. Song, D. Mao, H. Ling, and M. Li Microelectron. Eng. 75 2004 309 312
- (2004) Microelectron. Eng. , vol.75 , pp. 309-312
- Liu, Y.¹ Song, S.² Mao, D.³ Ling, H.⁴ Li, M.⁵

7
- 33646391224
- S.H. Kwon, O.K. Kwon, J.S. Min, and S.W. Kang J. Electrochem. Soc. 153 2006 G578 G581
- (2006) J. Electrochem. Soc. , vol.153
- Kwon, S.H.¹ Kwon, O.K.² Min, J.S.³ Kang, S.W.⁴

8
- 33846958725
- S. Rawal, D.P. Norton, H. Ajmera, T.J. Anderson, and L. McElwee-White Appl. Phys. Lett. 90 2007 051913
- (2007) Appl. Phys. Lett. , vol.90 , pp. 051913
- Rawal, S.¹ Norton, D.P.² Ajmera, H.³ Anderson, T.J.⁴ McElwee-White, L.⁵

9
- 43049105801
- C.W. Chen, J.S. Chen, and J.S. Jeng J. Electrochem. Soc. 155 2008 H438 H442
- (2008) J. Electrochem. Soc. , vol.155
- Chen, C.W.¹ Chen, J.S.² Jeng, J.S.³

10
- 42449125696
- P. Majumder, and C. Takoudis Nanotechnology 19 2008 205202
- (2008) Nanotechnology , vol.19 , pp. 205202
- Majumder, P.¹ Takoudis, C.²

11
- 41049090037
- L.C. Leu, D.P. Norton, L. McElwee-White, and T.J. Anderson Appl. Phys. Lett. 92 2008 111917
- (2008) Appl. Phys. Lett. , vol.92 , pp. 111917
- Leu, L.C.¹ Norton, D.P.² McElwee-White, L.³ Anderson, T.J.⁴

12
- 33646131179
- X.P. Qu, J.J. Tan, M. Zhou, T. Chen, Q. Xie, G.P. Ru, and B.Z. Li Appl. Phys. Lett. 88 2006 151912
- (2006) Appl. Phys. Lett. , vol.88 , pp. 151912
- Qu, X.P.¹ Tan, J.J.² Zhou, M.³ Chen, T.⁴ Xie, Q.⁵ Ru, G.P.⁶ Li, B.Z.⁷

13
- 65149088651
- Q. Xie, Y.L. Jiang, J. Musschoot, D. Deduytsche, C. Detavernier, R.L. Van Meirhaeghe, S. Van Den Berghe, G.P. Ru, B.Z. Li, and X.P. Qu Thin Solid Films 517 2009 4689 4693
- (2009) Thin Solid Films , vol.517 , pp. 4689-4693
- Xie, Q.¹ Jiang, Y.L.² Musschoot, J.³ Deduytsche, D.⁴ Detavernier, C.⁵ Van Meirhaeghe, R.L.⁶ Van Den Berghe, S.⁷ Ru, G.P.⁸ Li, B.Z.⁹ Qu, X.P.¹⁰

14
- 46649085712
- S.H. Kim, H.T. Kim, S.S. Yim, D.J. Lee, K.S. Kim, H.M. Kim, K.B. Kim, and H. Sohn J. Electrochem. Soc. 157 2008 589 594
- (2008) J. Electrochem. Soc. , vol.157 , pp. 589-594
- Kim, S.H.¹ Kim, H.T.² Yim, S.S.³ Lee, D.J.⁴ Kim, K.S.⁵ Kim, H.M.⁶ Kim, K.B.⁷ Sohn, H.⁸

15
- 23744448019
- J. Koike, and M. Wada Appl. Phys. Lett. 87 2005 041911
- (2005) Appl. Phys. Lett. , vol.87 , pp. 041911
- Koike, J.¹ Wada, M.²

16
- 77950291383
- A.M. Caro, S. Armini, O. Richard, G. Maes, G. Borghs, C.M. Whelan, and Y. Travaly Adv. Funct. Mater. 20 2010 1125 1131
- (2010) Adv. Funct. Mater. , vol.20 , pp. 1125-1131
- Caro, A.M.¹ Armini, S.² Richard, O.³ Maes, G.⁴ Borghs, G.⁵ Whelan, C.M.⁶ Travaly, Y.⁷

17
- 2942717044
- J.W. Yeh, S.K. Chen, S.J. Lin, J.Y. Gan, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang Adv. Eng. Mater. 6 2004 299 303
- (2004) Adv. Eng. Mater. , vol.6 , pp. 299-303
- Yeh, J.W.¹ Chen, S.K.² Lin, S.J.³ Gan, J.Y.⁴ Chin, T.S.⁵ Shun, T.T.⁶ Tsau, C.H.⁷ Chang, S.Y.⁸

18
- 4544284328
- J.W. Yeh, S.K. Chen, J.Y. Gan, S.J. Lin, T.S. Chin, T.T. Shun, C.H. Tsau, and S.Y. Chang Metall. Mater. Trans. A 35 2004 2533 2536
- (2004) Metall. Mater. Trans. A , vol.35 , pp. 2533-2536
- Yeh, J.W.¹ Chen, S.K.² Gan, J.Y.³ Lin, S.J.⁴ Chin, T.S.⁵ Shun, T.T.⁶ Tsau, C.H.⁷ Chang, S.Y.⁸

19
- 34247360495
- J.W. Yeh, S.Y. Chang, Y.D. Hong, S.K. Chen, and S.J. Lin Mater. Chem. Phys. 103 2007 41 46
- (2007) Mater. Chem. Phys. , vol.103 , pp. 41-46
- Yeh, J.W.¹ Chang, S.Y.² Hong, Y.D.³ Chen, S.K.⁴ Lin, S.J.⁵

20
- 63649149591
- S.Y. Chang, M.K. Chen, and D.S. Chen J. Electrochem. Soc. 156 2009 G37 G42
- (2009) J. Electrochem. Soc. , vol.156
- Chang, S.Y.¹ Chen, M.K.² Chen, D.S.³

21
- 67649136100
- S.Y. Chang, and D.S. Chen Appl. Phys. Lett. 94 2009 231909
- (2009) Appl. Phys. Lett. , vol.94 , pp. 231909
- Chang, S.Y.¹ Chen, D.S.²

22
- 76349115165
- S.Y. Chang, and D.S. Chen J. Electrochem. Soc. 157 2010 G154 G159
- (2010) J. Electrochem. Soc. , vol.157
- Chang, S.Y.¹ Chen, D.S.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.