Ultrafast relaxation of highly excited hot electrons in Si: Roles of the L-X intervalley scattering

Physical Review B - Condensed Matter and Materials Physics

Volumn 84, Issue 23, 2011, Pages

  Ichibayashi, T ^a   Tanaka, S ^a   Kanasaki, J ^a   Tanimura, K ^a   Fauster, Thomas ^b  

^a OSAKA UNIVERSITY   (Japan)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84855380879     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.84.235210     Document Type: Article

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