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Physical Review Letters

Volumn 107, Issue 17, 2011, Pages

Two-state double-continuum Fano resonance at the Si(100) surface

(3) Eickhoff, Christian a,b Teichmann, Martin a,b Weinelt, Martin a,b

a MAX BORN INSTITUT (Germany)

b FREIE UNIVERSITÄT BERLIN (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC EXTENSION; DESTRUCTIVE INTERFERENCE; DISCRETE STATE; DISCRETE SURFACES; FANO PROFILE; FANO RESONANCES; INTERFERENCE PATTERNS; INTERMEDIATE STATE; IONIZATION PROCESS; LIGHT CONVERSION; LIGHT-HARVESTING; LINE PROFILES; PHOTOABSORPTIONS; PHOTOELECTRON INTENSITIES; PHOTON ENERGY; SI(100) SURFACE; SURFACE RESONANCE; TWO PHOTON; TWO-PHOTON PHOTOEMISSION; TWO-STATE;

ELECTRON MOBILITY; MULTIPHOTON PROCESSES; PHOTONS; RESONANCE;

TWO DIMENSIONAL;

EID: 80054717691 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.107.176804 Document Type: Article

Times cited : (21)

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