A novel determination method of thin film optical parameters with least dependence on photometric measurement systematic errors

Optics and Laser Technology

Volumn 44, Issue 4, 2012, Pages 771-775

  Wu, Suyong ^a   Long, Xingwu ^a   Yang, Kaiyong ^a   Tan, Zhongqi ^a  

^a NATIONAL UNIVERSITY OF DEFENSE TECHNOLOGY   (China)

Author keywords

Optical characterization of thin films; Partial derivatives selection; Systematic photometry errors

Indexed keywords

INCIDENT ANGLES; MEASUREMENT DATA; OPTICAL CHARACTERIZATION; OPTICAL PARAMETER; P-POLARIZATION; PARTIAL DERIVATIVES; PHOTOMETRIC DATA; PHOTOMETRIC MEASUREMENTS; SINGLE WAVELENGTH; SPECTRAL BAND; SPECTRAL MEASUREMENT; SPECTRAL REGION; THEORETICAL EXPLANATION;

CHARACTERIZATION; ERRORS; MEASUREMENTS; OPTICAL VARIABLES CONTROL; PHOTOMETRY; SYSTEMATIC ERRORS; THIN FILMS;

OPTICAL FILMS;

EID: 84655169948     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2011.11.031     Document Type: Article

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