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Journal of Photopolymer Science and Technology

Volumn 23, Issue 2, 2010, Pages 149-154

Cross-sectional imaging of block copolymer thin films on chemically patterned surfaces

(8) Liu, Guoliang a Kang, Huiman a Craig, Gordon S W a Detcheverry, Francois a de Pablo, Juan J a Nealey, Paul F a Tada, Yasuhiko b Yoshida, Hiroshi b

a University of Wisconsin Madison (United States)

b HITACHI LTD (Japan)

Author keywords

Block copolymer; Cross section; Density multiplication; Directed assembly

Indexed keywords

EID: 77957082192 PISSN: 09149244 EISSN: 13496336 Source Type: Journal
DOI: 10.2494/photopolymer.23.149 Document Type: Article

Times cited : (16)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.