Induction of strand breaks in DNA films by low energy electrons and soft X-ray under nitrous oxide atmosphere

Radiation Physics and Chemistry

Volumn 81, Issue 1, 2012, Pages 33-39

  Alizadeh, Elahe ^a   Sanche, Léon ^a  

^a UNIVERSITY OF SHERBROOKE   (Canada)

Author keywords

DNA strand breaks; G value; Nitrous oxide; Radiosensitization

Indexed keywords

AMBIENT GAS; ATMOSPHERIC CONDITIONS; DNA FILMS; DNA MOLECULES; DNA STRAND BREAK; G-VALUES; LOW ENERGY ELECTRONS; LOW-ENERGY PHOTOELECTRONS; LOWER LIMITS; NITROUS OXIDE; OXYGENATED ENVIRONMENTS; PLASMID DNA; PRESSURE AND TEMPERATURE; RADIO-SENSITIZATION; SOFT X-RAY; SOFT X-RAY PHOTONS; STRAND BREAKS; SUPERCOILED DNA;

ANESTHETICS; ATMOSPHERIC PRESSURE; BIOMOLECULES; GLASS; MONOLAYERS; NITROGEN OXIDES; OXIDE FILMS; PHOTONS; SUN; TANTALUM; TANTALUM OXIDES; X RAYS;

DNA;

GLASS; NITROUS OXIDE; PLASMID DNA; TANTALUM;

AMBIENT AIR; ARTICLE; ATMOSPHERIC PRESSURE; CONTROLLED STUDY; DNA STRAND BREAKAGE; DNA SUPERCOILING; ELECTRON; ENERGY ABSORPTION; LOW ENERGY RADIATION; RADIATION EXPOSURE; RADIATION RESPONSE; RADIOSENSITIZATION; X IRRADIATION;

EID: 82455212255     PISSN: 0969806X     EISSN: 18790895     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2011.09.004     Document Type: Article

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