Comparison between X-ray photon and secondary electron damage to DNA in vacuum

Journal of Physical Chemistry B

Volumn 109, Issue 10, 2005, Pages 4796-4800

  Cai, Zhongli ^a   Cloutier, Pierre ^a   Hunting, Darel ^a   Sanche, Léon ^a  

^a UNIVERSITY OF SHERBROOKE   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

BIOMOLECULES; LOW ENERGY ELECTRON (LEE); SECONDARY ELECTRON DAMAGE; X-RAY PHOTONS;

ATTENUATION; CROSSLINKING; DNA; DOSIMETRY; ELECTROPHORESIS; KINETIC ENERGY; THICK FILMS; ULTRAHIGH VACUUM;

PHOTONS;

DNA; TANTALUM;

AGAR GEL ELECTROPHORESIS; ALGORITHM; ARTICLE; COMPARATIVE STUDY; DNA DAMAGE; ELECTRON; PHOTON; PLASMID; RADIATION EXPOSURE; RADIOMETRY; X RAY;

ALGORITHMS; DNA; DNA DAMAGE; ELECTRONS; ELECTROPHORESIS, AGAR GEL; PHOTONS; PLASMIDS; RADIOMETRY; TANTALUM; X-RAYS;

EID: 15944422093     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp0459458     Document Type: Article

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