XPS and RBS investigation of TiN xO y films prepared by vacuum arc discharge

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 271, Issue , 2012, Pages 102-106

  Ismail, I M ^a   Abdallah, B ^a   Abou Kharroub, M ^a   Mrad, O ^a  

^a DEPARTMENT OF MOLECULAR BIOLOGY AND BIOTECHNOLOGY   (Syrian Arab Republic)

Author keywords

RBS; TiN xO y; Vacuum arc discharge; XPS; XRD

Indexed keywords

CHAMBER TEMPERATURE; CHEMICAL COMPOSITIONS; CRYSTALLINE QUALITY; ELECTRICAL RESISTIVITY; HIGH-RESOLUTION SPECTRA; HIGHER TEMPERATURES; NITROGEN-RICH FILMS; RBS; ROOM TEMPERATURE; RUTHERFORD BACK-SCATTERING; THICKNESS OF THE FILM; TITANIUM OXYNITRIDE; VACUUM ARC DISCHARGE; VACUUM ARC DISCHARGES; X-RAY DIFFRACTION TECHNIQUES; XRD;

CHEMICAL ANALYSIS; ELECTRIC CONDUCTIVITY; PHOTOELECTRON SPECTROSCOPY; TITANIUM; TITANIUM NITRIDE; VACUUM; VACUUM APPLICATIONS; VACUUM TECHNOLOGY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

FILM PREPARATION;

EID: 82355164540     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2011.11.010     Document Type: Article

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