Dynamic scaling and optical properties of Zn(S, O, OH) thin film grown by chemical bath deposition

Chinese Physics B

Volumn 20, Issue 11, 2011, Pages

  Zhang, Yi ^a   Li, Bo Yan ^a   Dang, Xiang Yu ^a   Wu, Li ^a   Jin, Jing ^a   Li, Feng Yan ^a   Ao, Jian Ping ^a   Sun, Yun ^a  

^a NANKAI UNIVERSITY   (China)

Author keywords

growth behaviour; optical properties; roughness; Zn(S, O, OH)

Indexed keywords

CHEMICAL BATH DEPOSITION METHODS; CHEMICAL-BATH DEPOSITION; DYNAMIC SCALING; ENERGY BANDGAPS; GROWTH BEHAVIOUR; SCALING BEHAVIOR; SCALING EXPONENT; SHADOWING EFFECTS; SODA LIME GLASS SUBSTRATE;

DEPOSITION; FILM GROWTH; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; ZINC;

OPTICAL FILMS;

EID: 82155202937     PISSN: 16741056     EISSN: None     Source Type: Journal    
DOI: 10.1088/1674-1056/20/11/116802     Document Type: Article

References (31)

1. Bar M, Ennaoui A, Klaer J, Kropp T, Saez-Araoz R, Allsop N, Lauermann I, Schock H W and Lux-Steiner M C 2006 J. Appl. Phys. 99 123503
2. Islam M M, Ishizuka S, Yamada A, Sakurai K, Niki S, Sakurai T and Akimoto K 2009 Solar Energy Mater. Solar Cells 93 970
3. Vidal J, Vigil O, de Melo O, Lopez N and Zelaya-ngel O 1999 Mater. Chem. Phys. 61 139
4. Ma H, Ma G H, Wang W J, Gao X X and Ma H L 2008 Chin. Phys. B 17 1280
5. Pavaskar N R, Menezes C A and Sinha A P B 1977 J. Electrochem. Soc. 124 743
6. Kaur I, Pandya D K and Chopra K L 1980 J. Electrochem. Soc. 127 943
7. Dona J M and Herrero J 1992 J. Electrochem. Soc. 139 2810
8. Lincot D, Ortega-Borges R and Froment M 1994 Appl. Phys. Lett. 64 569
9. Cortes R, Froment M, Mokilim B and Lincot D 1996 Phil. Mag. Lett. 73 209
10. Zhang Y, Dang X Y, Jin J, Yu T, Li B Z, He Q, Li F Y and Sun Y 2010 Appl. Surf. Sci. 256 6871
11. Bhattacharya R N, Contreras M A and Teeter G 2004 Japan. J. Appl. Phys. 43B L1475
12. Vasseur K, Rollin C, Vandezande S, Temst K, Froyen L and Heremans P 2010 J. Phys. Chem. C 114 2730
13. He J F, Niu Z C, Chang X Y, Ni H Q, Zhu Y, Li M F and Shang X J 2010 Chin. Phys. B 20 018102
14. Barabasi A L and Stanley H E 1995 Fractal Concepts in Surface Growth (Cambridge: Cambridge University Press) p 20
15. Krug J 1997 Adv. Phys. 46 139
16. Bray K R and Parsons G N 2001 Phys. Rev. B 65 035311
17. Zhang Y, Barrena E, Zhang X N, Turak A, Maye F and Dosch H 2010 J. Phys. Chem. C 114 13752
18. Chen L, Zhang D and Chen Q 2006 Proc. 1st IEEE Int. Conf. on Nano/micro Engineered and Molecular Systems p 599
19. Nakada T, Furumi K and Kunioka A 1999 IEEE Trans. On Elec. Dev. 46 2093
20. Sirringhaus H, Brown P J, Friend R H, Nielsen M M, Bechgaard K, Langeveld-Voss B M W, Spiering A J, Janssen R A J, Herwig P and de Leeuw D M 1999 Nature 401 685
21. Kardar M, Parisi G and Zhang Y C 1986 Phys. Rev. Lett. 56 889
22. Lafouresse M C, Heard P J and Schwarzacher W 2007 Phys. Rev. Lett. 98 236101
23. Roennow D, Isidorsson J and Niklasson G A 1996 Phys. Rev. E 54 4021
24. Drotar J T, Zhao Y P, Lu T M and Wang G C 2000 Phys. Rev. B 62 2118
25. Duerr A C, Schreiber F, Ritley K A, Kruppa V, Krug J, Dosch H and Struth B 2003 Phys. Rev. Lett. 90 016104
26. das Sarma S and Tamborenea P 1991 Phys. Rev. Lett. 66 325
27. Wolf D and Villanin J 1990 Europhys. Lett. 13 389
28. Krug K, Stettner J and Magnussen O M 2006 Phys. Rev. Lett. 96 246101
29. Hayakawa R, Turak A, Zhang X N, Hiroshiba N, Dosch H, Chikyow T and Wakayama Y 2010 J. Chem. Phys. 133 034706
30. Dolatshahi-Pirouz A, Hovgaard M B, Rechendorff K, Chevallier J, Foss M and Besenbacher F 2008 Phys. Rev. B 77 115427
31. Platzer-Bjorkman C, Tomdahl T, Abou-Ras D, Malmstrom J, Kessler J and Stolt L 2006 J. Appl. Phys. 100 044506