Mask industry assessment: 2011

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Chan, Y David ^a  

^a SEMATECH   (United States)

Author keywords

Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

MASK INDUSTRY; MASK QUALITY; MASK YIELD; PHOTOMASK QUALITY; PHOTOMASK YIELD;

DATA HANDLING; MICROELECTRONICS; PHOTOMASKS; RATING; SURVEYS;

INDUSTRY;

EID: 81455149482     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.897308     Document Type: Conference Paper

References (16)

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