A mask industry assessment: 2002

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4889, Issue 1, 2002, Pages 1-14

  Kimmel, Kurt R ^a  

^a IBM   (United States)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

DATA PROCESSING; DATABASE SYSTEMS; ELECTRON BEAMS; ETCHING; MASKS;

DATA PREPARATION;

MICROELECTRONICS;

EID: 0037628615     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.467389     Document Type: Conference Paper

References (3)

1. th Annual Symposium on Photomask Technology and Management BACUS, Vol. 3873, pp. 162-174,
2. th Annual Symposium on Photomask Technology and Management BACUS, Vol. 3546, pp. 10-29, 1998
3. B.J. Grenon, Mask Makers Data Book, 2002 Edition, published by Grenon Consulting, Inc., 2002