Mask industry assessment: 2004

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 1-12

  Shelden, Gilbert ^a,c   Hector, Scott ^b  

^a Shelden Consulting   (United States)

^b International SEMATECH   (United States)

^c NONE   (United States)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

DATA ACQUISITION; DATA PROCESSING; DATA REDUCTION; DATABASE SYSTEMS; FLUORINE CONTAINING POLYMERS; MASKS;

MASK INDUSTRY; MASK QUALITY; MASK YIELD; PHOTOMASK QUALITY; PHOTOMASK YIELD; PHOTOMASKS;

MICROELECTRONICS;

EID: 19844364599     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.565034     Document Type: Conference Paper

References (5)

1. nd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 4889 Part 1, pp. 1-14, 2002.
2. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3873, pp. 162-174, 1999.
3. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3546, pp. 10-29, 1998.
4. B.J. Grenon, Mask Makers Data Book. 2002 Edition, published by Grenon Consulting, Inc., 2002.
5. rd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 5256, pp. 331-43, 2003.