Mask industry assessment: 2007

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6730, Issue , 2007, Pages

  Shelden, Gilbert ^a,c   Marmillion, Patricia ^b   Hughes, Greg ^b  

^a Shelden Consulting

^b SEMATECH   (United States)

^c SEMATECH ^*  (United States)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

MASK INDUSTRY; MASK QUALITY; PHOTOMASK QUALITY; PHOTOMASK YIELD;

ECONOMIC ANALYSIS; INDUSTRIAL MANAGEMENT; PHOTOMASKS; SEMICONDUCTOR DEVICE MANUFACTURE;

MICROELECTRONICS;

ELECTRONICS; INDUSTRIAL ENGINEERING; MASKING; PRODUCT DEVELOPMENT;

EID: 42149162465     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.730158     Document Type: Conference Paper

References (8)

1. nd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 4889 Part 1, pp. 1-14, 2002.
2. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3873, pp. 162-174, 1999.
3. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3546, pp. 10-29, 1998.
4. B.J. Grenon, Mask Makers Data Book, 2002 Edition, published by Grenon Consulting, Inc., 2002.
5. rd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 5256, pp. 331-43, 2003.
6. G. Shelden and S. Hector, "Mask industry Assessment, 2004," Photomask Technology Conference, Proceedings of SPIE Vol. 5567, pp. 1-12, 2004.
7. G. Shelden and S. Hector, "Mask industry Assessment, 2005," Photomask Technology Conference, Proceedings of SPIE Vol. 5992, 2005.
8. G. Shelden and P. Marmillion, "Mask industry Assessment, 2006," Photomask Technology Conference, Proceedings of SPIE 6349-2, 2006