Mask industry assessment trend analysis: 2010

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7545, Issue , 2010, Pages

  Hughes, Greg ^a   Yun, Henry ^a,b  

^a SEMATECH   (United States)

^b Intel Corporation Belgium   (Belgium)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

MASK INDUSTRY; MASK QUALITY; MASK YIELD; PHOTOMASK QUALITY; PHOTOMASK YIELD;

DATA PROCESSING; MICROELECTRONICS; PHOTOMASKS; SURVEYS;

INDUSTRY;

EID: 77957914377     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.865509     Document Type: Conference Paper

References (11)

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