Mask industry assessment trend analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7470, Issue , 2009, Pages

  Hughes, Greg ^a   Yun, Henry ^b  

^a SEMATECH   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

MASK INDUSTRY; MASK QUALITY; MASK YIELD; PHOTOMASK QUALITY; PHOTOMASK YIELD;

DATA PROCESSING; MICROELECTRONICS; PHOTOMASKS; SURVEYS;

INDUSTRY;

EID: 69949171238     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.835157     Document Type: Conference Paper

References (10)

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3. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol.3546, pp. 10-29, 1998.
4. B.J. Grenon, Mask Makers Data Book, 2002 Edition, published by Grenon Consulting, Inc., 2002.
5. rd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol.5256, pp. 331-343, 2003.
6. G. Shelden and S Hector, "Mask industry Assessment, 2004," Photomask Technology Conference, Proceedings of SPIE Vol.5567, pp. 1-12, 2004.
7. G. Shelden and S Hector, "Mask industry Assessment, 2005," Photomask Technology Conference, Proceedings of SPIE Vol.5992, 2005.
8. G. Shelden and P Marmillion, "Mask industry Assessment, 2006," Photomask Technology Conference, Proceedings of SPIE 6349-6352, 2006.
9. G. Shelden, P Marmillion and G Hughes "Mask industry Assessment, 2007," Photomask Technology Conference, Proceedings of SPIE 6730-6732, 2007 (to be published).
10. G. Hughes, H. Yun "Mask industry Assessment, 2008," Photomask Technology Conference, Proceedings of SPIE 7122-7202, 2008.