Mask industry assessment trend analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6792, Issue , 2008, Pages

  Shelden, Gilbert ^a,c   Marmillion, Patrica ^b   Hughes, Greg ^b  

^a Shelden Consulting   (United States)

^b SEMATECH   (United States)

^c NONE   (United States)

Author keywords

Industry; Mask industry; Mask quality; Mask yield; Photomask; Photomask quality; Photomask yield

Indexed keywords

(I ,J) CONDITIONS; ANNUAL REPORTS; BUSINESS PROFILE; COST FACTORS; CRITICAL ISSUES; CRITICAL PATHS; CYCLE TIME (CT); DELIVERY TIMES; EQUIPMENT UTILIZATION; EUROPEAN; GENERAL (CO); MASK INDUSTRY; MASK SUPPLY; MASK TECHNOLOGY; MICROELECTRONICS INDUSTRY; NORTH AMERICA; OBJECTIVE ASSESSMENT; SEMATECH (CO); SEMICONDUCTOR COMPANIES; SURVEY DATA; TREND ANALYSIS; YIELD LOSSES;

COMPUTER NETWORKS; COST BENEFIT ANALYSIS; COSTS; DATA PROCESSING; ELECTRONICS INDUSTRY; ENGINEERS; FINANCE; INDUSTRIAL ECONOMICS; LITHOGRAPHY; MICROELECTRONICS; OPERATING COSTS; SURVEYS; TECHNOLOGY;

INDUSTRY;

EID: 44949103149     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.798511     Document Type: Conference Paper

References (9)

1. nd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 4889 Part 1, pp. 1-14, 2002.
2. B.J. Grenon, "1999 Mask Industry Quality Assessment," 15* Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3873, pp. 162-174, 1999.
3. th Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 3546, pp. 10-29, 1998.
4. B.J. Grenon, Mask Makers Data Book, 2002 Edition, published by Grenon Consulting, Inc., 2002.
5. rd Annual Symposium on Photomask Technology and Management BACUS, Proceedings of SPIE Vol. 5256, pp. 331-43, 2003.
6. G. Shelden and S Hector, "Mask industry Assessment, 2004," Photomask Technology Conference, Proceedings of SPIE Vol. 5567, pp. 1-12, 2004
7. G. Shelden and S Hector, "Mask industry Assessment, 2005," Photomask Technology Conference, Proceedings of SPIE Vol. 5992, 2005
8. G. Shelden and P Marmillion, "Mask industry Assessment, 2006," Photomask Technology Conference, Proceedings of SPIE 6349-2, 2006
9. G. Shelden, P Marmillion and G Hughes "Mask industry Assessment, 2007," Photomask Technology Conference, Proceedings of SPIE 6730-2, 2007 (to be published)