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Volumn 46, Issue 7, 2011, Pages 615-625

Exploiting the features of energy-dispersive synchrotron diffraction for advanced residual stress and texture analysis

Author keywords

Depth profiling; Energy dispersive diffraction; In situ thinfilm characterization; Residual stress; Texture

Indexed keywords

BEAM LINES; DIFFRACTED BEAMS; ELEVATED TEMPERATURE; ENERGY-DISPERSIVE DIFFRACTION; EXTERNAL LOADS; HIGH ENERGY; HIGH SPATIAL RESOLUTION; IN-SITU; IN-SITU STUDY; MICROSTRUCTURE ANALYSIS; NOVEL METHODS; OUT-OF-PLANE DIFFRACTION; REAL-SPACE; RESIDUAL STRAINS; SCATTERING ANGLES; STRESS EVOLUTION; SYNCHROTRON DIFFRACTION; TEXTURE ANALYSIS;

EID: 81455148210     PISSN: 03093247     EISSN: 20413130     Source Type: Journal    
DOI: 10.1177/0309324711403824     Document Type: Article
Times cited : (38)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.