Effect of aluminum and indium co-doping on zinc oxide films prepared by dc magnetron sputtering

Thin Solid Films

Volumn 520, Issue 2, 2011, Pages 726-729

  Tohsophon, T ^a   Wattanasupinyo, N ^a   Silskulsuk, B ^a   Sirikulrat, N ^b  

^a SRINAKHARINWIROT UNIVERSITY   (Thailand)

^b CHIANG MAI UNIVERSITY   (Thailand)

Author keywords

Ceramic target; dc magnetron sputtering; TCO films; Zinc oxide films

Indexed keywords

ARGON ATMOSPHERES; CERAMIC TARGET; CO-DOPED; CO-DOPING; DC MAGNETRON SPUTTERING; DIRECT CURRENT MAGNETRON SPUTTERING; ELECTRICAL RESISTIVITY; FOUR-POINT PROBE TECHNIQUES; GLASS SUBSTRATES; INDIUM DOPING; LOW RESISTIVITY; OXIDE CERAMICS; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPE; SPUTTERING CONDITIONS; SUBSTRATE-TARGET DISTANCES; TCO FILMS; TRANSPARENT FILMS; UV-VISIBLE SPECTROPHOTOMETER;

ALUMINUM; CERAMIC MATERIALS; DC POWER TRANSMISSION; ELECTRIC CONDUCTIVITY; FILM PREPARATION; INDIUM; MAGNETRON SPUTTERING; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; SUBSTRATES; THIN FILMS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 80755175357     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.06.079     Document Type: Conference Paper

References (14)

1. K. Ellmer J. Phys. D Appl. Phys. 34 2001 3097
2. O. Kluth, B. Rech, L. Houben, S. Wieder, G. Schöpe, C. Beneking, H. Wagner, A. Löffl, and H.W. Schock Thin Solid Films 351 1999 247
3. T. Tohsophon, J. Huepkes, H. Siekmann, B. Rech, M. Schultheis, and N. Sirikulrat Thin Solid Films 516 2008 4628
4. B. Rech, T. Repmann, M.N. van den Donker, M. Berginski, T. Kilper, J. Hüpkes, S. Calnan, H. Stiebig, and S. Wieder Thin Solid Films 511-512 2006 548
5. R. Das, T. Jana, and S. Ray Sol. Energy Mater. Sol. Cells 86 2005 207
6. G.J. Fang, D. Li, and B.-L. Yao Thin Solid Films 418 2002 156
7. S.H. Jeong, J.W. Lee, S.B. Lee, and J.H. Boo Thin Solid Films 435 2003 78
8. J. Müller, B. Rech, J. Springer, and M. Vanecek Solar Energy 77 2004 917
9. K. Tominaga, T. Murayama, I. Mori, T. Okamoto, K. Hiruta, T. Moriga, and I. Nakabayashi Vacuum 59 2000 546
10. K. Tominaga, H. Fukumoto, K. Kondou, Y. Hayashi, K. Murai, T. Moriga, and I. Nakabayashi Vacuum 74 2004 683
11. A.J. Moulson, and J.M. Herbert Electroceramics: Materials, Properties and Application 2nd ed. 2003 John Wiley & Sons
12. X.-Y. Li, H.-J. Li, Z.-J. Wang, H. Xia, Z.-Y. Xiong, J.-X. Wang, and B.-C. Yang Opt. Commun. 282 2009 247
13. X.Q. Meng, W. Zhen, J.P. Guo, and X.J. Fan Appl. Phys. A 70 2000 421
14. R.K. Gupta, K. Ghosh, R. Patel, S.R. Mishra, and P.K. Kahol J. Cryst. Growth 310 2008 3019