Conductive transparent films deposited by simultaneous sputtering of zinc-oxide and indium-oxide targets

Vacuum

Volumn 59, Issue 2-3, 2000, Pages 546-552

  Tominaga, K ^a   Murayama, T ^a   Mori, I ^a   Okamoto, T ^a   Hiruta, K ^a   Moriga, T ^a   Nakabayashi, I ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000845773     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(00)00314-6     Document Type: Article

References (5)

1. Von H, Kasper Z. Anorg Allg Chemie 1967;349(3-4):113.
2. Minami T, Kakumu T, Tanaka S. J Vac Sci Technol A 1996;14:1704.
3. Minami T, Kakumu T, Takeda Y. Thin Solid Films 1996;290-291:1.
4. Moriga T, Edwards DD, Mason TO, Palmer GB, Poeppelmeier KR, Schndler JL, Kannewurt CR, Nakabayashi I. J Am Ceram Soc 1998;81:1310.
5. Minami T, Kakumu T, Takeda Y. Jpn J Appl Phys 1995;34:L971.