Al-impurity-doped transparent conductive oxide films of In 2O3-ZnO system

Vacuum

Volumn 74, Issue 3-4 SPEC. ISS., 2004, Pages 683-687

  Tominaga, K ^a   Fukumoto, H ^a   Kondou, K ^a   Hayashi, Y ^a   Murai, K ^a   Moriga, T ^a   Nakabayashi, I ^a  

^a UNIVERSITY OF TOKUSHIMA   (Japan)

Author keywords

Amorphous transparent conductive oxide films; In2O 3; TCO film; ZnO

Indexed keywords

ALUMINA; DOPING (ADDITIVES); ELECTRIC CONDUCTIVITY; ELECTRODES; ENERGY GAP; HYDROGEN; IMPURITIES; INDIUM COMPOUNDS; ZINC OXIDE;

ACTIVATED HYDROGEN; OPTICAL BAND GAP;

AMORPHOUS FILMS;

EID: 2442555771     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.01.042     Document Type: Article

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