Surface chemistry and annealing-driven interfacial changes in organic semiconducting thin films on silica surfaces

Langmuir

Volumn 27, Issue 22, 2011, Pages 13940-13949

  O'brien, Daniel B ^a   Anglin, Timothy C ^a   Massari, Aaron M ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; BURIED INTERFACE; DEVICE PERFORMANCE; ELECTRICAL CHARACTERIZATION; FUNCTIONALIZED SILICA; FUSED QUARTZ; GLASS SLIDES; MOLECULAR REARRANGEMENT; NATIVE OXIDES; OCTADECYL; ORGANIC SEMICONDUCTOR; ORGANIC SEMICONDUCTOR THIN FILMS; PERYLENE DERIVATIVES; SEMICONDUCTING THIN FILMS; SILICA SURFACE; SPECTROSCOPIC DATA; STRUCTURAL CHANGE; THERMAL-ANNEALING; TOPOGRAPHIC IMAGES; VIBRATIONAL SUM-FREQUENCY GENERATIONS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; COALESCENCE; ELECTRON MOBILITY; FIELD EFFECT TRANSISTORS; GRAIN BOUNDARIES; MONOLAYERS; QUARTZ; SEMICONDUCTING FILMS; SPECTROSCOPIC ELLIPSOMETRY; SUBSTRATES; SURFACE CHEMISTRY; THIN FILMS;

ANNEALING;

EID: 80755143185     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la202958a     Document Type: Article

References (46)

1. Horowitz, G. J. Mater. Res. 2004, 19, 1946-1962
2. Coropceanu, V.; Cornil, J.; da Silva, D. A.; Olivier, Y.; Silbey, R.; Bredas, J. L. Chem. Rev. 2007, 107, 926-952
3. Thompson, B. C.; Frechet, J. M. J. Angew. Chem., Int. Ed. 2008, 47, 58-77
4. Koch, N. ChemPhysChem 2007, 8, 1438-1455
5. Ando, T.; Fowler, A. B.; Stern, F. Rev. Mod. Phys. 1982, 54, 437-672
6. Chesterfield, R. J.; McKeen, J. C.; Newman, C. R.; Ewbank, P. C.; da Silva, D. A.; Bredas, J. L.; Miller, L. L.; Mann, K. R.; Frisbie, C. D. J. Phys. Chem. B 2004, 108, 19281-19292
7. Dodabalapur, A.; Katz, H. E.; Torsi, L.; Haddon, R. C. Science 1995, 269, 1560-1562
8. Facchetti, A.; Yoon, M. H.; Marks, T. J. Adv. Mater. 2005, 17, 1705-1725
9. Chen, Z.; Shen, Y. R.; Somorjai, G. A. Annu. Rev. Phys. Chem. 2002, 53, 437-465
10. Lambert, A. G.; Davies, P. B.; Neivandt, D. J. Appl. Spectrosc. Rev. 2005, 40, 103-145
11. Shen, Y. R. Appl. Phys. A 1994, 59, 541-543
12. Shen, Y. R. Annu. Rev. Phys. Chem. 1989, 40, 327-350
13. Anglin, T. C.; O'Brien, D. B.; Massari, A. M. J. Phys. Chem. C 2010, 114, 17629-17637
14. Anglin, T. C.; Speros, J. C.; Massari, A. M. J. Phys. Chem. C 2011, 115, 16027-16036
15. Ye, H.; Huang, J.; Park, J. R.; Katz, H. E.; Gracias, D. H. J. Phys. Chem. C 2007, 111, 13250-13255
16. Simpson, G. J.; Rowlen, K. L. Acc. Chem. Res. 2000, 33, 781-789
17. Wang, H. F.; Gan, W.; Lu, R.; Rao, Y.; Wu, B. H. Int. Rev. Phys. Chem. 2005, 24, 191-256
18. Karak, S.; Reddy, V. S.; Ray, S. K.; Dhar, A. Org. Electron. 2009, 10, 1006-1010
19. Han, S. H.; Lee, K. J.; Lee, S. H.; Jang, J. J. Non-Cryst. Solids 2008, 354, 2870-2874
20. Petit, M.; Hayakawa, R.; Wakayama, Y.; Chikyow, T. J. Phys. Chem. C 2007, 111, 12747-12751
21. Krauss, T. N.; Barrena, E.; de Oteyza, D. G.; Zhang, X. N.; Major, J.; Dehm, V.; Wurthner, F.; Dosch, H. J. Phys. Chem. C 2009, 113, 4502-4506
22. Sadowski, J. T.; Sazaki, G.; Nishikata, S.; Al-Mahboob, A.; Fujikawa, Y.; Nakajima, K.; Tromp, R. M.; Sakurai, T. Phys. Rev. Lett. 2007, 98
23. Hiroshiba, N.; Hayakawa, R.; Petit, M.; Chikyow, T.; Matsuishi, K.; Wakayama, Y. Org. Electron. 2009, 10, 1032-1036
24. Sirringhaus, H. Adv. Mater. 2005, 17, 2411-2425
25. Jones, B. A.; Facchetti, A.; Wasielewski, M. R.; Marks, T. J. Adv. Funct. Mater. 2008, 18, 1329-1339
26. Handbook of Silicon Wafer Cleaning Technology, 2 nd ed.; Reinhardt, K. A.; Kern, W., Eds.; William Andrew: Norwich, NY, 2008.
27. Anttila, O. J.; Tilli, M. V. J. Electrochem. Soc. 1992, 139, 1751-1756
28. Ito, Y.; Virkar, A. A.; Mannsfeld, S.; Oh, J. H.; Toney, M.; Locklin, J.; Bao, Z. A. J. Am. Chem. Soc. 2009, 131, 9396-9404
29. Handbook of Ellipsometry; Tompkins, H. G.; Irene, E. A., Eds.; Springer: Heidelberg, 2005.
30. Horowitz, G. Adv. Mater. 1998, 10, 365-377
31. Liu, Y.; Wolf, L. K.; Messmer, M. C. Langmuir 2001, 17, 4329-4335
32. Antunes, P. A.; Constantino, C. J. L.; Aroca, R.; Duff, J. Appl. Spectrosc. 2001, 55, 1341-1346
33. Guhathakurta-Ghosh, U.; Aroca, R. J. Phys. Chem. 1989, 93, 6125-6128
34. Feller, M. B.; Chen, W.; Shen, Y. R. Phys. Rev. A 1991, 43, 6778-6792
35. Tong, Y. J.; Zhao, Y. B.; Li, N.; Osawa, M.; Davies, P. B.; Ye, S. J. Chem. Phys. 2010, 133
36. Holman, J.; Davies, P. B.; Neivandt, D. J. J. Phys. Chem. B 2004, 108, 1396-1404
37. Moad, A. J.; Simpson, G. J. J. Phys. Chem. B 2004, 108, 3548-3562
38. Hall, S. A.; Jena, K. C.; Trudeau, T. G.; Hore, D. K. J. Phys. Chem. C 2011, 115, 11216-11225
39. Knittl, Z. Optics of Thin Films; John Wiley and Sons: New York, 1976.
40. Chen, C. Y.; Wang, J.; Even, M. A.; Chen, Z. Macromolecules 2002, 35, 8093-8097
41. Gautam, K. S.; Dhinojwala, A. Phys. Rev. Lett. 2002, 88
42. Jayathilake, H. D.; Zhu, M. H.; Rosenblatt, C.; Bordenyuk, A. N.; Weeraman, C.; Benderskii, A. V. J. Chem. Phys. 2006, 125
43. Liptay, W. Angew. Chem., Int. Ed. 1969, 8, 177-188
44. Cho, M. J. Chem. Phys. 2009, 130, 15
45. Pensack, R. D.; Banyas, K. M.; Asbury, J. B. Phys. Chem. Chem. Phys. 2010, 12, 14144-14152
46. Horowitz, G.; Hajlaoui, R.; Bouchriha, H.; Bourguiga, R.; Hajlaoui, M. Adv. Mater. 1998, 10, 923-927