Metrology sampling strategies for process monitoring applications

IEEE Transactions on Semiconductor Manufacturing

Volumn 24, Issue 4, 2011, Pages 489-498

  Vincent, Tyrone L ^a   Stirton, James Broc ^b   Poolla, Kameshwar ^c  

^a Department of Geology and Geological Engineering   (United States)

^b GLOBALFOUNDRIES   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Advanced process control; canonical correlation analysis; principal component analysis; site sampling; systematic variation; within wafer control

Indexed keywords

ADVANCED PROCESS CONTROL; CANONICAL CORRELATION ANALYSIS; PRINCIPAL COMPONENTS; SITE SAMPLING; SYSTEMATIC VARIATION; WITHIN-WAFER CONTROL;

CONTROL SYSTEMS; INTELLIGENT CONTROL; MANUFACTURE; PRINCIPAL COMPONENT ANALYSIS; PROCESS MONITORING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICON WAFERS; STATISTICAL MECHANICS; UNITS OF MEASUREMENT;

PROCESS CONTROL;

EID: 80455149730     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2011.2159139     Document Type: Article

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