Robust approach to determine the optimized illumination condition using process window analysis

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6607, Issue PART 2, 2007, Pages

  Chun, Yong Jin ^a   Lee, Sung Woo ^a   Lee, Sooryong ^b   Lee, Young Mi ^a   Suh, Sungsoo ^a   Lee, Suk Joo ^a   Cho, Han Ku ^a   Park, Ho Jin ^b   Falch, Brad ^b  

^a SAMSUNG Electronics   (South Korea)

^b Synopsys Korea Inc   (South Korea)

Author keywords

DoF; Illuminator optimization; OPC; Process margin; Process window

Indexed keywords

DATA STORAGE EQUIPMENT; ERROR CORRECTION; INTEGRATED CIRCUIT MANUFACTURE; PRINTED CIRCUIT BOARDS;

DEPTH OF FOCUS (DOF); ILLUMINATOR OPTIMIZATION; MASK ERROR ENHANCEMENT FACTOR (MEEF); PROCESS MARGIN; PROCESS WINDOW;

MASKS;

EID: 36249017272     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.729026     Document Type: Conference Paper

References (4)

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3. T. Brist, G. E. Bailey , A. Drozdov , A. Torres, A. Estroff, E. Hendrickx, "Source polarization and OPC effects on illumination and optimization", Proceedings of SPIE, Vol.5992, 599232, 2005
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