Characterization of epitaxial BiFeO3 thin films prepared by ion beam sputtering

Current Applied Physics

Volumn 11, Issue 3 SUPPL., 2011, Pages

  Nakashima, Seiji ^a   Tsujita, Yosuke ^a   Fujisawa, Hironori ^a   Park, Jung Min ^b   Kanashima, Takeshi ^b   Okuyama, Masanori ^b   Shimizu, Masaru ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b OSAKA UNIVERSITY   (Japan)

Author keywords

BFO; Ion beam sputtering; Thin film

Indexed keywords

BFO; D-E HYSTERESIS LOOP; EPITAXIALLY GROWN; ION BEAM SPUTTERING; MEASUREMENT FREQUENCY; SINGLE PHASE; SRTIO;

BEAM PLASMA INTERACTIONS; EPITAXIAL GROWTH; HYSTERESIS LOOPS; ION BEAMS; ION BOMBARDMENT; IONS; PEROVSKITE; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

VAPOR DEPOSITION;

EID: 80255138073     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.11.066     Document Type: Conference Paper

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