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Volumn 105, Issue 6, 2009, Pages

Improvement of ferroelectric properties of BiFeO3 thin films by postmetallization annealing and electric field application

(3) Nakamura, Yoshitaka a Nakashima, Seiji a Okuyama, Masanori a

a OSAKA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SOLUTION DEPOSITIONS; COERCIVE FIELDS; CRYSTALLINITY; FERROELECTRIC PROPERTIES; FIELD APPLICATIONS; HIGH ELECTRIC FIELDS; POLYCRYSTALLINE BIFEO; POST-METALLIZATION ANNEALING; PT ELECTRODES; REMANENT POLARIZATIONS;

ANNEALING; APPLICATIONS; ELECTRIC FIELD EFFECTS; ELECTRIC FIELD MEASUREMENT; FERROELECTRICITY; PLATINUM; POLARIZATION; THIN FILMS;

SEMICONDUCTING BISMUTH COMPOUNDS;

EID: 63749097215 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3078751 Document Type: Article

Times cited : (19)

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