High rate reactive deposition of TiO2 films using two sputtering sources

Vacuum

Volumn 84, Issue 12, 2010, Pages 1377-1380

  Hoshi, Yoichi ^a   Ishihara, Daiki ^a   Sakai, Tetsuya ^a   Kamiya, Osamu ^a   Lei, Hao ^a  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

Author keywords

High rate deposition; Photo catalytic film; Reactive sputtering; TiO2 film

Indexed keywords

DEPOSITION; DEPOSITION RATES; OXIDE MINERALS; OXYGEN; OXYGEN SUPPLY; REACTIVE SPUTTERING; SPUTTERING; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

DEPOSITION CHAMBERS; HIGH-RATE DEPOSITION; PHOTO-CATALYTIC; REACTIVE DEPOSITION; RUTILE STRUCTURE; SPUTTERING CONDITIONS; SUBSTRATE SURFACE; TITANIUM ATOMS;

SPUTTER DEPOSITION;

EID: 77956441259     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.12.013     Document Type: Conference Paper

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