Design of an interferometer for EUV interference lithography at the NIST SURF III synchrotron

Proceedings - ASPE Spring Topical Meeting on Precision Mechanical Design and Mechatronics for Sub-50nm Semiconductor Equipment, ASPE 2008

Volumn 43, Issue , 2008, Pages 117-122

  Cole, Kenan ^a   Vallance, R Ryan ^a   Lucatorto, Thomas ^b  

^a GEORGE WASHINGTON UNIVERSITY   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84884369380     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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2. M. L. Schattenburg, C. Chen, P. N. Everett, J. Ferrera, P. Konkola, and H. I. Smith. Sub-100 nm metrology using interferometrically produced fiducials. J. Vac. Sci. Technol. B., 17: 2692-2697, 1999.
3. H. H. Solak, D. He, W. Li, and F. Cerrina. Nanolithography using extreme ultraviolet lithography interferometry: 19 nm lines and spaces. J. Vac. Sci. Technol. B., 17: 3052-3057, 1999.
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5. S. T. Smith. Flexures: Elements of Elastic Mechanisms. CRC Press, 2000.
6. J. M. Paros and L. Weisbord. How to design flexural hinges. Machine Design, pages 151-156, November 1965.
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