Novolak resin for ultrafast high resolution positive i-line photoresist compositions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1189-1200

  Rahman, M D ^a   Lu, Ping Hung ^a   Cook, Michelle M ^a   Kim, Woo Kyu ^a   Khanna, Dinesh N ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

Lithography; Novolak resin; Photoresist; Polydispersity

Indexed keywords

PHENOLS; PHOTORESISTORS; PHOTORESISTS; POLYDISPERSITY; RESINS; SURFACE TREATMENT; VOLCANIC ROCKS;

CONDENSATION PRODUCTS; HIGH RESOLUTIONS; IMPROVED PROCESS; LITHOGRAPHIC PROPERTIES; NOVOLAK RESIN; PHENOL FORMALDEHYDES; ULTRA FASTS;

PHENOLIC RESINS;

EID: 1542703512     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312347     Document Type: Conference Paper

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