Novel novolak "block" copolymers for advanced i-line resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 1092-1102

  Wanat, Stan F ^a   Rahman, M D ^a   Dixit, Sunit S ^a   Lu, Ping Hung ^a   McKenzie, Douglas S ^a   Cook, Michelle M ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHROMATOGRAPHIC ANALYSIS; DISSOLUTION; FUNCTIONAL POLYMERS; GELATION; OLIGOMERS; PHENOLS; POLYMERS; RESINS;

CONCENTRATION OF; LOW MOLECULAR WEIGHTS; NOVOLAK; NOVOLAK RESINS; PERFORMANCE ENHANCEMENTS; PHENOLIC MONOMERS; PHOTOACTIVE COMPOUNDS; RESIST FORMULATIONS; STARTING MATERIALS; THERMAL RESISTANCES;

PHENOLIC RESINS;

EID: 60849097872     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312451     Document Type: Conference Paper

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