Novel strategies for novolak resin fractionation: Consequences for advanced photoresist applications

Polymer Engineering and Science

Volumn 40, Issue 10, 2000, Pages 2251-2261

  Narasimhan, Balaji ^a   Wanat, Stanley F ^b   Rahman, M Dalil ^b  

^a The State University of New Jersey   (United States)

^b CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CENTRIFUGATION; CONDENSATION; DISSOLUTION; FRACTIONATION; LITHOGRAPHY; METHANOL; MOLECULAR WEIGHT; PHOTORESISTS; SOLUTIONS; SOLVENTS; WATER;

NOVOLAK RESINS;

RESINS;

EID: 0034294131     PISSN: 00323888     EISSN: None     Source Type: Journal    
DOI: 10.1002/pen.11357     Document Type: Article

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