Low polydispersity novolak resins for i-line resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3678, Issue II, 1999, Pages 1185-1192

  Wanat, Stanley ^a   Rahman, M Dalil ^a   Durham, Dana ^a   McKenzie, Douglas ^a   Cook, Michelle ^a  

^a CLARIANT CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION; DISPERSIONS; MOLECULAR WEIGHT; PHENOLIC RESINS; SYNTHESIS (CHEMICAL);

NOVOLAK RESINS;

PHOTORESISTS;

EID: 0032662156     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.350169     Document Type: Conference Paper

References (6)