Specific contact resistance measurements of the screen-printed Ag thick film contacts in the silicon solar cells by three-point probe methodology and TLM method

Journal of Materials Science: Materials in Electronics

Volumn 22, Issue 9, 2011, Pages 1248-1257

  Vinod, P N ^a  

^a NAVAL PHYSICAL AND OCEANOGRAPHIC LABORATORY   (India)

Author keywords

[No Author keywords available]

Indexed keywords

AG CONTACTS; AG THICK FILM; AIR AMBIENT; BEST VALUE; CONTACT FORMATION; CONTACT STRUCTURE; CRYSTALLINE SILICON SOLAR CELLS; EXTRACTION PROCEDURE; MEASUREMENT TECHNIQUES; METAL CONTACTS; NITROGEN AMBIENT; POROUS SILICON SURFACES; SCREEN-PRINTED; SPECIFIC CONTACT RESISTANCES; TEST METHODOLOGY; TEST SAMPLES; TEST STRUCTURE; TLM METHOD; TRANSFER LENGTHS;

ANTIREFLECTION COATINGS; CONTACT RESISTANCE; ELECTRIC ARCS; EXTRACTION; POROUS SILICON; PROBES; SILICON SOLAR CELLS; THICK FILMS;

SILVER;

EID: 80054995332     PISSN: 09574522     EISSN: 1573482X     Source Type: Journal    
DOI: 10.1007/s10854-011-0295-z     Document Type: Article

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