Modeling and characterization of high-efficiency silicon solar cells fabricated by rapid thermal processing, screen printing, and plasma-enhanced chemical vapor deposition

IEEE Transactions on Electron Devices

Volumn 44, Issue 9, 1997, Pages 1417-1424

  Doshi, Parag ^a   Mejia, Jose ^a   Tate, Keith ^a   Rohatgi, Ajeet ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; PASSIVATION; PHOTOLITHOGRAPHY; SCREEN PRINTING;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD);

SILICON SOLAR CELLS;

EID: 0031237903     PISSN: 00189383     EISSN: None     Source Type: Journal    
DOI: 10.1109/16.622596     Document Type: Article

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