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Volumn 12, Issue 1, 2012, Pages 179-183
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Photocatalytic TiO2 thin films deposited on flexible substrates by radio frequency (RF) reactive magnetron sputtering
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Author keywords
Flexible substrates; Photocatalytic TiO2 films; Reactive sputtering; Taguchi method
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Indexed keywords
DEPOSITION PARAMETERS;
DEPOSITION PROCESS;
DEPOSITION TIME;
FLEXIBLE SUBSTRATE;
METALLIC TITANIUM;
METHYLENE BLUE;
ORTHOGONAL ARRAY;
PHOTO-CATALYTIC;
PHOTO-INDUCED DECOMPOSITION;
PHOTOCATALYTIC PERFORMANCE;
PHOTOCATALYTIC TIO2 FILMS;
PLASMA GAS;
RADIO FREQUENCIES;
REACTIVE GAS;
REACTIVE MAGNETRON SPUTTERING;
RF-POWER;
SIGNAL TO NOISE;
SUBSTRATE TEMPERATURE;
TAGUCHI;
TAGUCHI'S METHODS;
TIO;
UV-VIS-NIR SPECTROSCOPY;
ANALYSIS OF VARIANCE (ANOVA);
ARGON;
NEAR INFRARED SPECTROSCOPY;
RADIO;
RADIO WAVES;
SCANNING ELECTRON MICROSCOPY;
SIGNAL TO NOISE RATIO;
TAGUCHI METHODS;
THIN FILMS;
TITANIUM;
TITANIUM DIOXIDE;
VAPOR DEPOSITION;
X RAY DIFFRACTION;
SUBSTRATES;
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EID: 80054806521
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2011.05.027 Document Type: Article |
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Times cited : (18)
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References (12)
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