Crystallization kinetics of amorphous sputtered Nb-doped TiO2 thin films

Applied Physics Express

Volumn 4, Issue 10, 2011, Pages

  Hoang, Ngoc Lam Huong ^a,b   Hirose, Yasushi ^a,b   Nakao, Shoichiro ^a,b   Hasegawa, Tetsuya ^a,b  

^a UNIVERSITY OF TOKYO   (Japan)

^b KANAGAWA ACADEMY OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AVRAMI EXPONENT; EX SITU; IN-SITU; JOHNSON-MEHL-AVRAMI ANALYSIS; LATERAL SIZES; MICROSCOPIC OBSERVATIONS; OXYGEN CONTENT; TIO; TWO-DIMENSIONAL CRYSTALS;

AMORPHOUS FILMS; CRYSTAL GROWTH; FILM GROWTH; ISOTHERMAL ANNEALING; THIN FILMS; TITANIUM DIOXIDE; TWO DIMENSIONAL; X RAY DIFFRACTION;

CRYSTALLIZATION KINETICS;

EID: 80054060459     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.4.105601     Document Type: Article

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