Nitrogen effects on crystallization kinetics of amorphous TiOxNy thin films

Journal of Materials Research

Volumn 17, Issue 3, 2002, Pages 550-555

  Hukari, Kyle ^a   Dannenberg, Rand ^a   Stach, E A ^b  

^a AFG Development Corporation   (United States)

^b LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AMORPHOUS FILMS; CRYSTALLIZATION; DIFFUSION; NITROGEN; NUCLEATION; REACTION KINETICS; REFRACTIVE INDEX; THERMAL EFFECTS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY;

NUCLEATION TEMPERATURE;

THIN FILMS;

EID: 0036507310     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.2002.0077     Document Type: Article

References (20)