Thermal crystallization kinetics and crystallite size distribution of amorphous ITO film deposited in the presence or absence of water vapor

Thin Solid Films

Volumn 518, Issue 11, 2010, Pages 2992-2995

  Wang, Meihan ^a   Sawada, Yutaka ^a   Lei, Hao ^a   Seki, Yoshiyuki ^a   Hoshi, Yoichi ^a   Uchida, Takayuki ^a   Konya, Takayuki ^b   Kishi, Akira ^b  

^a TOKYO POLYTECHNIC UNIVERSITY   (Japan)

^b RIGAKU CORPORATION   (Japan)

Author keywords

Amorphous ITO film; Crystallite size distribution; Sputtering; Thermal crystallization kinetics; Water vapor

Indexed keywords

AMORPHOUS ITO FILM; CHEMICALLY BONDED; HIGH TEMPERATURE X-RAY DIFFRACTION; INDIUM TIN OXIDE FILMS; ISOTHERMAL CRYSTALLIZATION; ITO FILMS; JOHNSON MEHL AVRAMI EQUATION; KINETIC ANALYSIS; KINETIC EXPONENT; KOLMOGOROV; NUCLEATION MODELS; PEAK INTENSITY; RATE OF CRYSTALLIZATION; THERMAL CRYSTALLIZATION; THERMAL CRYSTALLIZATION KINETICS;

ACTIVATION ANALYSIS; ACTIVATION ENERGY; COMPUTATIONAL COMPLEXITY; CRYSTALLITE SIZE; CRYSTALLIZATION KINETICS; ITO GLASS; OXIDE FILMS; SIZE DISTRIBUTION; TIN; TITANIUM COMPOUNDS; WATER ANALYSIS; WATER VAPOR; X RAY DIFFRACTION ANALYSIS;

AMORPHOUS FILMS;

EID: 77649112121     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.08.015     Document Type: Article

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