Growth behavior and optical properties of N-doped Cu2O films

Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 212-216

  Li, H J ^a   Pu, C Y ^a   Ma, C Y ^a   Li, Sh ^a   Dong, W J ^a   Bao, S Y ^a   Zhang, Q Y ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Cuprous oxide; Growth mechanism; Nitrogen doping; Optical properties; Sputtering; Surface morphology

Indexed keywords

BAND GAP TRANSITION; CRITICAL NUCLEI; CUPROUS OXIDE; FILM TEXTURES; GRAIN SIZE; GROWTH BEHAVIOR; GROWTH MECHANISM; LOW TEMPERATURES; N-DOPED; N-DOPING; NITROGEN DOPING; OPTICAL BAND GAP ENERGY; SURFACE FREE ENERGY;

ATOMIC FORCE MICROSCOPY; ENERGY GAP; FILM GROWTH; GRAIN SIZE AND SHAPE; OPTICAL PROPERTIES; SEMICONDUCTOR DOPING; SURFACE MORPHOLOGY;

COPPER;

EID: 80054048973     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.07.037     Document Type: Article

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