Effect of plused negative bias on nucleation and morphological evolution of ZnO films deposited by reactive radio-frequency magnetron sputtering

Wuji Cailiao Xuebao/Journal of Inorganic Materials

Volumn 24, Issue 3, 2009, Pages 602-606

  Fu, Wei Jia ^a   Liu, Zhi Wen ^a   Gu, Jian Feng ^a   Liu, Ming ^a   Zhang, Qing Yu ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Bias; Morphological analysis; Reactive radio frequency magnetron sputtering; ZnO films

Indexed keywords

BIAS; DEFECT NUCLEATION; DEPOSITION TIME; DYNAMIC SCALING THEORY; FILM DEPOSITION; GRAIN SIZE; GROWTH EXPONENT; ISLAND DENSITY; ISLAND SIZE; MORPHOLOGICAL ANALYSIS; MORPHOLOGICAL EVOLUTION; NEGATIVE BIAS; NUCLEATION AND GROWTH; PREFERRED ORIENTATIONS; REACTIVE RADIO-FREQUENCY MAGNETRON SPUTTERING; SI (001) SUBSTRATE; ZNO FILMS;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ION BOMBARDMENT; MAGNETRON SPUTTERING; MAGNETRONS; METALLIC FILMS; MORPHOLOGY; NUCLEATION; SEMICONDUCTING ALUMINUM COMPOUNDS; ZINC OXIDE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 66149128088     PISSN: 1000324X     EISSN: None     Source Type: Journal    
DOI: 10.3724/SP.J.1077.2009.00602     Document Type: Article

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