Optimized Ar +-ion milling procedure for TEM cross-section sample preparation

Ultramicroscopy

Volumn 111, Issue 11, 2011, Pages 1636-1644

  Dieterle, Levin ^a   Butz, Benjamin ^b   Müller, Erich ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

Analytical TEM; Argon ion milling; High resolution TEM; Monte Carlo simulation; Quantitative EELS; Sample preparation; Sputtering yield

Indexed keywords

ANALYTICAL TEM; ARGON ION MILLING; HIGH-RESOLUTION TEM; MONTE-CARLO SIMULATION; SAMPLE PREPARATION; SPUTTERING YIELD;

IONS; OPTIMIZATION; SILICON; TRANSMISSION ELECTRON MICROSCOPY;

MILLING (MACHINING);

ARGON;

ARTICLE; CHEMICAL ANALYSIS; ELECTRON ENERGY LOSS SPECTROSCOPY; MATHEMATICAL ANALYSIS; MONTE CARLO METHOD; PROCESS OPTIMIZATION; QUANTITATIVE ANALYSIS; ROENTGEN SPECTROSCOPY; SIMULATION; TOPOGRAPHY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 80053461453     PISSN: 03043991     EISSN: 18792723     Source Type: Journal    
DOI: 10.1016/j.ultramic.2011.08.014     Document Type: Article

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