SCOPUS 정보 검색 플랫폼

Electrochimica Acta

Volumn 56, Issue 24, 2011, Pages 8979-8988

High-performance electrodeposited Co-rich CoNiReP permanent magnets

(7) Pane S a Pellicer, E b Sivaraman, K M a Surinach S b Baro M D b Nelson, B J a Sort, J b

a ETH ZURICH (Switzerland)

b UNIVERSITAT AUTÒNOMA DE BARCELONA (Spain)

Author keywords

Co Ni Re P alloy; Hard magnetic material; Mechanical properties; Thin film

Indexed keywords

ACIDIC PH VALUES; APPLIED CURRENT; CATHODIC CURRENT DENSITY; DEPOSITION TECHNIQUE; DIRECT CURRENT; ELECTROLESS; GALVANOSTATICS; GRAIN SIZE; HARD MAGNETIC PROPERTY; HARDNESS VALUES; INTRINSIC COERCIVITY; PERMANENT MAGNETIC MATERIAL; PERPENDICULAR MAGNETIC ANISOTROPY; REVERSE PULSE PLATING;

ALLOYS; AMORPHOUS ALLOYS; AMORPHOUS FILMS; CRYSTALLINE MATERIALS; CURRENT DENSITY; ELECTROPLATING; FERROMAGNETIC MATERIALS; FERROMAGNETISM; HARDNESS; MAGNETIC ANISOTROPY; MECHANICAL PROPERTIES; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; PERMANENT MAGNETS; SATURATION MAGNETIZATION; THIN FILMS;

COBALT;

EID: 80052798906 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2011.07.138 Document Type: Article

Times cited : (10)

References (50)

1
- 0025436934
- K.J. Strnat Proc. IEEE 78 1990 923
- (1990) Proc. IEEE , vol.78 , pp. 923
- Strnat, K.J.¹

2
- 1442296191
- Institute of Physics Publishing Bristol
- R. Skomski, and J.M.D. Coey Permanent Magnetism (Condensed Matter Physics) 1999 Institute of Physics Publishing Bristol
- (1999) Permanent Magnetism (Condensed Matter Physics)
- Skomski, R.¹ Coey, J.M.D.²

3
- 0037238533
- J.I. Martín, J. Nogués, K. Liu, J.L. Vicent, and I.K. Schuller J. Magn. Magn. Mater. 256 2003 449
- (2003) J. Magn. Magn. Mater. , vol.256 , pp. 449
- Martín, J.I.¹ Nogués, J.² Liu, K.³ Vicent, J.L.⁴ Schuller, I.K.⁵

4
- 0035161148
- C.A. Ross Annu. Rev. Mater. Res. 31 2001 203
- (2001) Annu. Rev. Mater. Res. , vol.31 , pp. 203
- Ross, C.A.¹

5
- 0001635524
- J.A. Christodoulides, Y. Huang, Y. Zhang, G.C. Hadjipanayis, I. Panagiotopoulos, and D. Niarchos J. Appl. Phys. 87 2000 6938
- (2000) J. Appl. Phys. , vol.87 , pp. 6938
- Christodoulides, J.A.¹ Huang, Y.² Zhang, Y.³ Hadjipanayis, G.C.⁴ Panagiotopoulos, I.⁵ Niarchos, D.⁶

6
- 0034135247
- T.S. Chin J. Magn. Magn. Mater. 209 2000 75
- (2000) J. Magn. Magn. Mater. , vol.209 , pp. 75
- Chin, T.S.¹

7
- 33846540776
- G. Pattanaik, D.M. Kirkwood, X. Xu, and G. Zangari Electrochim. Acta 52 2007 2755
- (2007) Electrochim. Acta , vol.52 , pp. 2755
- Pattanaik, G.¹ Kirkwood, D.M.² Xu, X.³ Zangari, G.⁴

8
- 71549128016
- D.P. Arnold, and N. Wang J. Microelectromech. Syst. 18 2009 1255
- (2009) J. Microelectromech. Syst. , vol.18 , pp. 1255
- Arnold, D.P.¹ Wang, N.²

9
- 0024112708
- H. Matsubara, H. Mizutani, S. Mitamura, T. Osaka, and F. Goto IEEE Trans. Magn. 24 1988 3018
- (1988) IEEE Trans. Magn. , vol.24 , pp. 3018
- Matsubara, H.¹ Mizutani, H.² Mitamura, S.³ Osaka, T.⁴ Goto, F.⁵

10
- 17744379747
- T. Homma, K. Saito, and T. Osaka Jpn. J. Appl. Phys. 29 1990 1701
- (1990) Jpn. J. Appl. Phys. , vol.29 , pp. 1701
- Homma, T.¹ Saito, K.² Osaka, T.³

11
- 0026928887
- T. Homma, and T. Osaka J. Electrochem. Soc. 139 1992 2925
- (1992) J. Electrochem. Soc. , vol.139 , pp. 2925
- Homma, T.¹ Osaka, T.²

12
- 0026819984
- H. Matsuda, O. Takano, and P.J. Grundy J. Magn. Magn. Mater. 109 1992 133
- (1992) J. Magn. Magn. Mater. , vol.109 , pp. 133
- Matsuda, H.¹ Takano, O.² Grundy, P.J.³

13
- 43049127829
- E. Valova, S. Armyanov, J. Dille, Y. Van Ingelgem, A. Hubin, and O. Steenhaut J. Electrochem. Soc. 155 2008 D449
- (2008) J. Electrochem. Soc. , vol.155 , pp. 449
- Valova, E.¹ Armyanov, S.² Dille, J.³ Van Ingelgem, Y.⁴ Hubin, A.⁵ Steenhaut, O.⁶

14
- 28444449489
- E. Koukharenko, M. Kraft, G.J. Ensell, and N. Hollinshead J. Mater. Sci. Mater. Electron. 16 2005 741
- (2005) J. Mater. Sci. Mater. Electron. , vol.16 , pp. 741
- Koukharenko, E.¹ Kraft, M.² Ensell, G.J.³ Hollinshead, N.⁴

15
- 69249139121
- A. Naor, N. Eliaz, and E. Gileadi Electrochim. Acta 54 2009 6028
- (2009) Electrochim. Acta , vol.54 , pp. 6028
- Naor, A.¹ Eliaz, N.² Gileadi, E.³

16
- 18444410212
- S. Guan, and B.J. Nelson J. Electrochem. Soc. 152 2005 C190
- (2005) J. Electrochem. Soc. , vol.152 , pp. 190
- Guan, S.¹ Nelson, B.J.²

17
- 0030245514
- T.M. Liakopoulos, W. Zhang, and C.H. Ahn IEEE Trans. Magn. 32 1996 5154
- (1996) IEEE Trans. Magn. , vol.32 , pp. 5154
- Liakopoulos, T.M.¹ Zhang, W.² Ahn, C.H.³

18
- 27744507974
- W.B. Ng, A. Takada, and K. Okada IEEE Trans. Magn. 41 2005 3886
- (2005) IEEE Trans. Magn. , vol.41 , pp. 3886
- Ng, W.B.¹ Takada, A.² Okada, K.³

19
- 33846899497
- R.N. Emerson, C.J. Kennady, and S. Ganesan Thin Solid Films 515 2007 3391
- (2007) Thin Solid Films , vol.515 , pp. 3391
- Emerson, R.N.¹ Kennady, C.J.² Ganesan, S.³

20
- 77956664356
- P. Cojocaru, L. Magagnin, E. Gómez, and E. Vallés J. Alloys Compd. 503 2010 454
- (2010) J. Alloys Compd. , vol.503 , pp. 454
- Cojocaru, P.¹ Magagnin, L.² Gómez, E.³ Vallés, E.⁴

21
- 38949134530
- M.S. Chandrasekar, and M. Pushpavanam Electrochim. Acta 53 2008 3313
- (2008) Electrochim. Acta , vol.53 , pp. 3313
- Chandrasekar, M.S.¹ Pushpavanam, M.²

22
- 0012489320
- F.F. Ling, Springer New York
- A.C. Fischer-Cripps F.F. Ling, Nanoindentation 2004 Springer New York
- (2004) Nanoindentation
- Fischer-Cripps, A.C.¹

23
- 0026875935
- W.C. Oliver, and G.M. Pharr J. Mater. Res. 7 1992 1564
- (1992) J. Mater. Res. , vol.7 , pp. 1564
- Oliver, W.C.¹ Pharr, G.M.²

24
- 78650517491
- O. Ergeneman, K.M. Sivaraman, S. Pané, E. Pellicer, A. Teleki, A.M. Hirt, M.D. Baró, and B.J. Nelson Electrochim. Acta 56 2011 1399
- (2011) Electrochim. Acta , vol.56 , pp. 1399
- Ergeneman, O.¹ Sivaraman, K.M.² Pané, S.³ Pellicer, E.⁴ Teleki, A.⁵ Hirt, A.M.⁶ Baró, M.D.⁷ Nelson, B.J.⁸

25
- 0032201862
- N. Zech, E.J. Podlaha, and D. Landolt J. Appl. Electrochem. 28 1998 1251
- (1998) J. Appl. Electrochem. , vol.28 , pp. 1251
- Zech, N.¹ Podlaha, E.J.² Landolt, D.³

26
- 0032154340
- F. Lantelme, A. Seghiouer, and A. Derja J. Appl. Electrochem. 28 1998 907
- (1998) J. Appl. Electrochem. , vol.28 , pp. 907
- Lantelme, F.¹ Seghiouer, A.² Derja, A.³

27
- 0037103488
- A. Bai, and C.-C. Hu Electrochim. Acta 47 2002 3447
- (2002) Electrochim. Acta , vol.47 , pp. 3447
- Bai, A.¹ Hu, C.-C.²

28
- 10044260071
- P. Tsay, C.-C. Hu, and C.-K. Wang Mater. Chem. Phys. 89 2005 275
- (2005) Mater. Chem. Phys. , vol.89 , pp. 275
- Tsay, P.¹ Hu, C.-C.² Wang, C.-K.³

29
- 0242337689
- D.P. Daly, and F.J. Barry Int. Mater. Rev. 48 2003 326
- (2003) Int. Mater. Rev. , vol.48 , pp. 326
- Daly, D.P.¹ Barry, F.J.²

30
- 0031168947
- K. Sridharan, and K. Sheppard J. Mater. Process. Technol. 68 1997 109
- (1997) J. Mater. Process. Technol. , vol.68 , pp. 109
- Sridharan, K.¹ Sheppard, K.²

31
- 0030168928
- J. Herreros, J.M. Barandiarán, and A. García-Arribas J. Non-Cryst. Solids 201 1996 102
- (1996) J. Non-Cryst. Solids , vol.201 , pp. 102
- Herreros, J.¹ Barandiarán, J.M.² García-Arribas, A.³

32
- 77950193675
- E. Pellicer, A. Varea, S. Pané, B.J. Nelson, E. Menéndez, M. Estrader, S. Suriñach, M.D. Baró, J. Nogués, and J. Sort Adv. Funct. Mater. 20 2010 983
- (2010) Adv. Funct. Mater. , vol.20 , pp. 983
- Pellicer, E.¹ Varea, A.² Pané, S.³ Nelson, B.J.⁴ Menéndez, E.⁵ Estrader, M.⁶ Suriñach, S.⁷ Baró, M.D.⁸ Nogués, J.⁹ Sort, J.¹⁰

33
- 0040312996
- The International Centre for Diffraction Data
- The powder diffraction file database PCPDFWIN v. 2.00, The International Centre for Diffraction Data, 1998.
- (1998) The Powder Diffraction File Database PCPDFWIN V. 2.00

34
- 0037130334
- D.-Y. Park, N.V. Myung, M. Schwartz, and K. Nobe Electrochim. Acta 47 2002 2893
- (2002) Electrochim. Acta , vol.47 , pp. 2893
- Park, D.-Y.¹ Myung, N.V.² Schwartz, M.³ Nobe, K.⁴

35
- 34250008508
- C.A. Schuh, T.C. Hufnagel, and U. Ramamurty Acta Mater. 55 2007 4067
- (2007) Acta Mater. , vol.55 , pp. 4067
- Schuh, C.A.¹ Hufnagel, T.C.² Ramamurty, U.³

36
- 27644516486
- N. Togasaki, Y. Okinaka, T. Homma, and T. Osaka Electrochim. Acta 51 2005 882
- (2005) Electrochim. Acta , vol.51 , pp. 882
- Togasaki, N.¹ Okinaka, Y.² Homma, T.³ Osaka, T.⁴

37
- 51149093022
- J. Lamovec, V. Jović, D. Randjelović, R. Aleksić, and V. Radojević Thin Solid Films 516 2008 8646
- (2008) Thin Solid Films , vol.516 , pp. 8646
- Lamovec, J.¹ Jović, V.² Randjelović, D.³ Aleksić, R.⁴ Radojević, V.⁵

38
- 13444293192
- L.P. Wang, Y. Gao, and Q.J. Xue Appl. Surf. Sci. 242 2005 326
- (2005) Appl. Surf. Sci. , vol.242 , pp. 326
- Wang, L.P.¹ Gao, Y.² Xue, Q.J.³

39
- 16244371024
- J.N. Balaraju, and K.S. Rajam Surf. Coat. Technol. 195 2005 154
- (2005) Surf. Coat. Technol. , vol.195 , pp. 154
- Balaraju, J.N.¹ Rajam, K.S.²

40
- 34249944526
- M. Dao, L. Lu, R.J. Asaro, J.T.M. De Hosson, and E. Ma Acta Mater. 55 2007 4041
- (2007) Acta Mater. , vol.55 , pp. 4041
- Dao, M.¹ Lu, L.² Asaro, R.J.³ De Hosson, J.T.M.⁴ Ma, E.⁵

41
- 0016070580
- R.D. Arnell J. Phys. D: Appl. Phys. 7 1974 1225
- (1974) J. Phys. D: Appl. Phys. , vol.7 , pp. 1225
- Arnell, R.D.¹

42
- 77954261092
- K. Honda, and Y. Shirakawa Sci. Rep. Res. Inst. Tohoku Univ. A 1 1949 9
- (1949) Sci. Rep. Res. Inst. Tohoku Univ. A , vol.1 , pp. 9
- Honda, K.¹ Shirakawa, Y.²

43
- 76649135851
- ASM International US
- F. Campbell Elements of Metallurgy and Engineering Alloys 2008 ASM International US 547
- (2008) Elements of Metallurgy and Engineering Alloys , pp. 547
- Campbell, F.¹

44
- 1342302474
- J.L. Bucaille, S. Stauss, P. Schwaller, and J. Michler Thin Solid Films 447-448 2004 239
- (2004) Thin Solid Films , vol.447-448 , pp. 239
- Bucaille, J.L.¹ Stauss, S.² Schwaller, P.³ Michler, J.⁴

45
- 0036671567
- J.Y. Song, and J. Yu Thin Solid Films 415 2002 167
- (2002) Thin Solid Films , vol.415 , pp. 167
- Song, J.Y.¹ Yu, J.²

46
- 69949111602
- J. Fornell, S. Suriñach, M.D. Baró, and J. Sort Intermetallics 17 2009 1090
- (2009) Intermetallics , vol.17 , pp. 1090
- Fornell, J.¹ Suriñach, S.² Baró, M.D.³ Sort, J.⁴

47
- 0034324823
- A. Leyland, and A. Matthews Wear 246 2000 1
- (2000) Wear , vol.246 , pp. 1
- Leyland, A.¹ Matthews, A.²

48
- 17744379801
- T. Osaka Chem. Rec. 4 2004 346
- (2004) Chem. Rec. , vol.4 , pp. 346
- Osaka, T.¹

49
- 0024732276
- T. Osaka, H. Matsubara, M. Toda, and T. Homma J. Electrochem. Soc. 136 1989 2637
- (1989) J. Electrochem. Soc. , vol.136 , pp. 2637
- Osaka, T.¹ Matsubara, H.² Toda, M.³ Homma, T.⁴

50
- 0025387707
- T. Osaka, T. Homma, K. Inoue, Y. Yamazaki, and T. Namikawa IEEE Transl. J. Magn. Jpn. 5 1990 154
- (1990) IEEE Transl. J. Magn. Jpn. , vol.5 , pp. 154
- Osaka, T.¹ Homma, T.² Inoue, K.³ Yamazaki, Y.⁴ Namikawa, T.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.