Electrodeposited Co-Ni-Re-W-P thick array of high vertical magnetic anisotropy

IEEE Transactions on Magnetics

Volumn 41, Issue 10, 2005, Pages 3886-3888

  Ng, Wei Beng ^a   Takada, Akio ^b   Okada, Kanzo ^a  

^a Sony Electronics Asia Pacific Pte Ltd   (Singapore)

^b SONY CORPORATION   (Japan)

Author keywords

Cobalt alloys; Cylindrical arrays; Electrochemical processes; Magnetic films; Perpendicular magnetic anisotropy

Indexed keywords

COMPOSITION; ELECTRODEPOSITION; MAGNETIC FILMS; MAGNETIZATION; MICROELECTROMECHANICAL DEVICES; REMANENCE;

CYLINDRICAL ARRAYS; ELECTROCHEMICAL PROCESS; PERPENDICULAR MAGNETIC ANISOTROPY; PROCESS CONDITIONS; THICK ARRAYS;

MAGNETIC MATERIALS;

EID: 27744507974     PISSN: 00189464     EISSN: None     Source Type: Journal    
DOI: 10.1109/TMAG.2005.854942     Document Type: Article

References (14)

1. D. Niarchos, "Magnetic MEMS: Key issues and some applications," Sens. Actuators A, vol. 106, pp. 255-262, 2003.
2. W. Schwarzacher and D. S. Lashmore, "Giant Magnetoresistance in electrodeposited films," IEEE Trans. Magn., vol. 32, no. 4, pp. 3133-3153, Jul. 1996.
3. I. Zana and G. Zangari, "Co-Pt micromagnets by electrodeposition, " J. Appl. Phys., vol. 91, pp. 7320-7322, May 2002.
4. H. J. Cho, S. Bhansali, and C. H. Ahn, "Electroplated thick permanent magnet arrays with controlled direction of magnetization for MEMS application," J. Appl. Phys., vol. 87, pp. 6340-6342, May 2000.
5. D. J. Sadler, T. M. Liakopoulos, and C. H. Ahn, "A universal electromagnetic micoactuator using magnetic interconnection concepts," J. Microelectromech. Syst., vol. 9, pp. 460-468, Dec. 2000.
6. H. J. Cho and C. H. Ahn, "A bidirectional magnetic microactuator using electroplated permanent magnet arrays," J. Microelectromech. Syst., vol. 11, pp. 78-84, Feb. 2002.
7. T. Osaka, T. Homma, and T. Yokoshima, "Electroless depsoition of cobalt alloy films," in Modern Electroplating, 4th ed, M. Schlesinger and M. Paunovic, Eds. New York: Wiley, 2000.
8. D. Y. Park, N. V. Myung, M. Schwartz, and K. Nobe, "Nanostructured magnetic CoNiP electrodeposits: Structure-property relationships," Electrochimica Acta, vol. 47, pp. 2893-2900, 2002.
9. T. Yokoshima, J. Kawaji, T. Osaka, A. Takada, W. B. Ng, and T. Mochizuki, Extended Abstract for the 109th Conf. of the Surf. Finishing Society of Japan, Tokyo, Japan, Mar. 2004, pp. 15-17. In Japanese.
10. S. Franz, M. Bestetti, M. Consonni, and P. L. Cavallotti, "Electrodeposition of micromagnets of CoPtW(P) alloys," Microelectron. Eng., vol. 64, pp. 487-494, 2002.
11. G. Zangari, P. Bucher, P. L. Cavallotti, L. Callegaro, and E. Puppin, "Magnetic properties of electroplated Co-Pt films," J. Magn. Magn. Mater., vol. 157, no. 158, pp. 256-257, 1996.
12. P. L. Cavallotti, N. Lecis, H. Fauser, A. Zielonka, J. P. Celis, G. Wouters, D. S. Machado, J. M. B. Oliverira, and M. A. Sa, " Electrodeposition of magnetic multilayers," Surf. Coat. Tech., vol. 105, pp. 232-239, Jun. 1998.
13. C. A. Ross, M. Hwang, M. Shima, J. Y. Cheng, M. Farhoud, T. A. Savas, W. Schwarzacher, F. M. Ross, M. Redjdal, and F. B. Humphrey, "Micromagnetic behavior of electrodeposited cylinder arrays," Phys. Rev. B Condens. Matter, vol. 65, pp. 144 417/1-144 417/8, Apr. 2002.
14. E. H. Conradie and D. F. Moore, "SU-8 thick photoresist processing as a functional material for MEMS applications," J. Micromech. Microeng., vol. 12, pp. 368-374, 2002.