Anisotropic etching induced by surface energy driven agglomeration

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 29, Issue 5, 2011, Pages

  Jung Jung, Soon ^a   Lutz, Tarek ^a   Boland, John J ^a  

^a TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

BI-LAYER; CRYSTALLINE SEMICONDUCTORS; ETCHING PROCESS; INTERFACIAL COMPOSITION; PIT FORMATION; PRE-PATTERNING; SURFACE ENERGIES;

AGGLOMERATION; ANISOTROPY; CRYSTAL STRUCTURE; GERMANIUM; SCANNING ELECTRON MICROSCOPY; SURFACE CHEMISTRY; SURFACE MORPHOLOGY;

ANISOTROPIC ETCHING;

EID: 80052412481     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3626795     Document Type: Article

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