A solid-liquid-vapor mechanism for anisotropic silicon etching

Applied Physics Letters

Volumn 93, Issue 26, 2008, Pages

  O'Toole, Martin ^a   Boland, John J ^a  

^a TRINITY COLLEGE DUBLIN   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; DISSOLUTION; ELECTRIC WIRE; ETCHING; EUTECTICS; NONMETALS; SEMICONDUCTING SILICON; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SUBSTRATES; VAPORS;

ANISOTROPIC SILICON ETCHINGS; EUTECTIC COMPOSITIONS; EUTECTIC MATERIALS; GOLD LINES; SEMICONDUCTOR NANOWIRES; SI ATOMS; SILICON SUBSTRATES; SILICON SURFACES; SOLID LIQUID VAPORS;

ANISOTROPIC ETCHING;

EID: 58149234637     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3055606     Document Type: Article

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