Rapid prototyping of silicon microstructures by means of a new masking process and crystal orientation dependent etching

Sensors and Actuators, A: Physical

Volumn 163, Issue 1, 2010, Pages 388-392

  Hilbig, David ^a   Hannemann, Birgit ^a  

^a HOCHSCHULE BREMEN   (Germany)

Author keywords

Etching; KOH; Mask; Nd:YAG; Rapid prototyping; Silicon

Indexed keywords

DEEP ETCHING; ETCH PROCESS; KOH; LASER DIRECT WRITING; LASER MARKING SYSTEM; MASK LAYER; METAL FILM; ND: YAG; ORIENTATION DEPENDENT ETCHINGS; SHAPE QUALITY; SILICON MICROMACHINING; SILICON MICROSTRUCTURES;

CONCURRENT ENGINEERING; ETCHING; JOB ANALYSIS; MARKING MACHINES; NEODYMIUM; POTASSIUM HYDROXIDE; RAPID PROTOTYPING; SILICON COMPOUNDS; SILICON OXIDES;

CRYSTAL ORIENTATION;

EID: 77957660894     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sna.2010.07.017     Document Type: Article

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